Nano anti-fingerprint anti-dazzle film and preparation process thereof
A preparation process and anti-glare film technology, applied in the field of nano anti-fingerprint anti-glare film and its preparation process, can solve the problems of uneven distribution of unevenness on the surface of the substrate, poor dispersion of inorganic particles, uneven dispersion, etc., and achieve excellent anti-glare protection. The effect of glare performance, high practicability and simple operation
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Embodiment 1
[0037] A preparation process for a nano anti-fingerprint anti-glare film, comprising the following steps:
[0038] (1) The preparation steps of magnetic silicon dioxide are:
[0039] A: Take oleic acid, octadecene and ferric oleate, mix and stir for 15 minutes, heat up to 310°C under nitrogen atmosphere, the heating rate is 3°C / min, keep warm for 40 minutes, ethanol precipitate after natural cooling, and centrifuge to obtain four Ferric oxide nanocrystals;
[0040] B: Take cetyltrimethylammonium bromide, urea and deionized water, mix and stir for 20 minutes to obtain material A;
[0041] Take ferric oxide nanocrystals and cyclohexane, mix and stir to dissolve, add tetraethyl orthosilicate and n-amyl alcohol, continue to stir for 10 minutes, add material A, stir for 30 minutes, react at 120°C for 4 hours, wash and dry, and then place Calcined at 550°C for 6h to obtain magnetic silica.
[0042] Take magnetic silica and dispersing agent, the mass ratio of magnetic silica and d...
Embodiment 2
[0048] A preparation process for a nano anti-fingerprint anti-glare film, comprising the following steps:
[0049] (1) The preparation steps of magnetic silicon dioxide are:
[0050] A: Take oleic acid, octadecene and ferric oleate, mix and stir for 18 minutes, heat up to 315°C under nitrogen atmosphere, the heating rate is 3°C / min, keep warm for 35 minutes, ethanol precipitate after natural cooling, and centrifuge to obtain four Ferric oxide nanocrystals;
[0051] B: Take cetyltrimethylammonium bromide, urea and deionized water, mix and stir for 25 minutes to obtain material A;
[0052] Take ferric oxide nanocrystals and cyclohexane, mix and stir to dissolve, add tetraethyl orthosilicate and n-amyl alcohol, continue to stir for 12 minutes, add material A, stir for 32 minutes, react at 122°C for 4 hours, wash and dry, and place in Calcined at 555°C for 5.5h to obtain magnetic silica.
[0053] Take magnetic silica and dispersant, the mass ratio of magnetic silica and dispers...
Embodiment 3
[0059] A preparation process for a nano anti-fingerprint anti-glare film, comprising the following steps:
[0060] (1) The preparation steps of magnetic silicon dioxide are:
[0061] A: Take oleic acid, octadecene and ferric oleate, mix and stir for 20 minutes, heat up to 320°C under nitrogen atmosphere, the heating rate is 3°C / min, keep warm for 30 minutes, ethanol precipitate after natural cooling, and centrifuge to obtain four Ferric oxide nanocrystals;
[0062] B: Take cetyltrimethylammonium bromide, urea and deionized water, mix and stir for 30 minutes to obtain material A;
[0063] Take ferric oxide nanocrystals and cyclohexane, mix and stir to dissolve, add tetraethyl orthosilicate and n-amyl alcohol, continue to stir for 15 minutes, add material A, stir for 35 minutes, react at 125°C for 3.8 hours, wash and dry, and then set Calcined at 560°C for 5h to obtain magnetic silica.
[0064] Take magnetic silica and dispersing agent, the mass ratio of magnetic silica and d...
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