Si-based double-sided double-junction AlGaAs solar cell and preparation method thereof
A solar cell, double-sided technology, applied in the field of solar photovoltaic, can solve the problems of high cost, complicated preparation process, unsuitable for large-scale industrial production, etc., to reduce the preparation cost, the preparation process is simple, and it is beneficial to the popularization and popularization of large-scale industrialization Effect
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[0055] Example 1:
[0056] like figure 1 As shown, the present invention provides a Si-based double-sided double-noded AlGaAs solar cell, including: n-type Si substrate 1 and an N-type AlGaAs functional layer 5;
[0057] The n-type Si substrate 1 is double-sided polished, and the upper and lower surfaces are doped to form P. + -Si layers 2 and N + -Si layer 3; the upper and lower surfaces of the n-type AlGaAs function layer 5 are doped to form n + -Algaas layer 6 and P + -Algaas layer 7, N + -AlgaAs layer 6 forms AlGaas tunnel knot 4, ALGAAS tunnel 4 nuts in P + -SI layer 2; p + -AlgaAs layer 7 is formed with a reflective film 10, an ohmic contact layer 11 and a front electrode 12, N + The Decimensional Film 10, the ohmic contact layer 11, and the back electrode 13 are formed on the -Si layer 3.
[0058] Among them, n-type AlGaAs functional layers 5, N + -Algaas layer 6, P + -Algaas layer 7 and AlGaas tunnel knots 4 is Al 0.10 GA 0.90 AS.
[0059] This preparation method includes:...
Example Embodiment
[0065] Example 2:
[0066] like figure 2 As shown, the present invention provides a Si-based double-sided double-noded AlGaAs solar cell, including: N-type Si substrate 1, N-type AlGaAs functional layer 5, and P-type AlgaaS functional layer 8;
[0067] The n-type Si substrate 1 is double-sided polished, and the upper and lower surfaces are doped to form P. + -Si layers 2 and N + -SI layer 3; P + -Si layer 2 sequentially grows there is a GaAs buffer layer 9, AlGaAs tunnel knot 4, N + -Algaas layer 6, N-type AlGaAs functional layer 5, P-type AlgaaS function layer 8, P + -Algaas layer 7; P + -AlgaAs layer 7 is formed with a reflective film 10, an ohmic contact layer 11 and a front electrode 12, N + The Decimensional Film 10, the ohmic contact layer 11, and the back electrode 13 are formed on the -Si layer 3.
[0068] Among them, n-type AlGaAs functional layers 5, N + -Algaas layer 6 and AlgaaS tunnel knots 4 is Al 0.20 GA 0.80 AS, P + -Algaas layer 7 and p-type AlgaaS function layer ...
Example Embodiment
[0078] Example 3:
[0079] like image 3 As shown, the present invention provides a Si-based double-sided double-noded AlGaAs solar cell, including: N-type Si substrate 1, N-type AlGaAs functional layer 5, and P-type AlgaaS functional layer 8;
[0080] The n-type Si substrate 1 is double-sided polished, and the upper and lower surfaces are doped to form P. + -Si layers 2 and N + -Si layer 3; the lower surface of the n-type AlGaAs function layer 5 is doped to form N, respectively. + -Algaas layer 6 and AlgaaS tunnel 4, Algaas tunnel 4 junction in P + -Si layer 2 ;; P-type AlGaAs function layer 8 is bonded to the upper surface of the n-type AlGaAs functional layer 5, and the upper surface doping form of the P-type AlGaAs functional layer 8 forms P + -Algaas layer 7; P + -AlgaAs layer 7 is formed with a reflective film 10, an ohmic contact layer 11 and a front electrode 12, N + The Decimensional Film 10, the ohmic contact layer 11, and the back electrode 13 are formed on the -Si layer...
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