Si-based double-sided double-junction AlGaAs solar cell and preparation method thereof
A solar cell, double-sided technology, applied in the field of solar photovoltaic, can solve the problems of high cost, complicated preparation process, unsuitable for large-scale industrial production, etc., to reduce the preparation cost, the preparation process is simple, and it is beneficial to the popularization and popularization of large-scale industrialization Effect
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Embodiment 1
[0056] Such as figure 1 As shown, the present invention provides a Si-based double-sided double-junction AlGaAs solar cell, comprising: an N-type Si substrate 1 and an N-type AlGaAs functional layer 5;
[0057] The N-type Si substrate 1 is double-sided polished, and its upper and lower surfaces are doped to form P + - Si layer 2 and N + -Si layer 3; the upper and lower surfaces of the N-type AlGaAs functional layer 5 are respectively doped to form N + - AlGaAs layer 6 and P + - AlGaAs layer 7, N + -AlGaAs tunnel junction 4 is formed on the AlGaAs layer 6, and the AlGaAs tunnel junction 4 is bonded to the P + - on Si layer 2; P + -An anti-reflection film 10, an ohmic contact layer 11 and a front electrode 12 are formed on the AlGaAs layer 7, N + -An anti-reflection film 10 , an ohmic contact layer 11 and a rear electrode 13 are formed on the Si layer 3 .
[0058] Among them, the N-type AlGaAs functional layer 5, N + - AlGaAs layer 6, P + -AlGaAs layer 7 and AlGaAs tunn...
Embodiment 2
[0066] Such as figure 2 As shown, the present invention provides a Si-based double-sided double-junction AlGaAs solar cell, comprising: an N-type Si substrate 1, an N-type AlGaAs functional layer 5 and a P-type AlGaAs functional layer 8;
[0067] The N-type Si substrate 1 is double-sided polished, and its upper and lower surfaces are doped to form P + - Si layer 2 and N + - Si layer 3; P + -GaAs buffer layer 9, AlGaAs tunnel junction 4, N + -AlGaAs layer 6, N-type AlGaAs functional layer 5, P-type AlGaAs functional layer 8, P + - AlGaAs layer 7; P + -An anti-reflection film 10, an ohmic contact layer 11 and a front electrode 12 are formed on the AlGaAs layer 7, N + -An anti-reflection film 10 , an ohmic contact layer 11 and a rear electrode 13 are formed on the Si layer 3 .
[0068] Among them, the N-type AlGaAs functional layer 5, N + -AlGaAs layer 6 and AlGaAs tunnel junction 4 are Al 0.20 Ga 0.80 As,P + -AlGaAs layer 7 and P-type AlGaAs functional layer 8 are Al ...
Embodiment 3
[0079] Such as image 3 As shown, the present invention provides a Si-based double-sided double-junction AlGaAs solar cell, comprising: an N-type Si substrate 1, an N-type AlGaAs functional layer 5 and a P-type AlGaAs functional layer 8;
[0080] The N-type Si substrate 1 is double-sided polished, and its upper and lower surfaces are doped to form P + - Si layer 2 and N + -Si layer 3; the lower surface of the N-type AlGaAs functional layer 5 is doped to form N + - AlGaAs layer 6 and AlGaAs tunnel junction 4, AlGaAs tunnel junction 4 bonded in P + - on the Si layer 2; the P-type AlGaAs functional layer 8 is bonded on the upper surface of the N-type AlGaAs functional layer 5, and the upper surface of the P-type AlGaAs functional layer 8 is doped to form P + - AlGaAs layer 7; P + -An anti-reflection film 10, an ohmic contact layer 11 and a front electrode 12 are formed on the AlGaAs layer 7, N + -An anti-reflection film 10 , an ohmic contact layer 11 and a rear electrode 13 ...
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