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Three-layer polyester film for dry film resist and preparation method thereof

A polyester film and resist technology, which is applied to the polyester film for three-layer dry film resist and its preparation field, can solve the problem of not giving the data of the light transmittance of the polyester film and the light transmittance of the polyester film. problems such as decrease and haze increase, and achieve good antistatic effect and good sliding performance.

Pending Publication Date: 2022-02-25
WEIFANG FUWEI PLASTIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The antistatic agent used in this patent is nano-scale titanium oxide, tin oxide, zinc oxide or mica flakes, and the incorporation of nano-silica mainly plays the role of slip agent. According to the currently known data, the nano-powder Dispersion is relatively difficult, and uneven dispersion will definitely lead to a decrease in the light transmittance of the polyester film and an increase in the haze. The patent does not disclose the operation process of uniformly dispersing the selected nano-powder into the polyester body, nor does it give the prepared Obtain the data of light transmittance of polyester film

Method used

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  • Three-layer polyester film for dry film resist and preparation method thereof
  • Three-layer polyester film for dry film resist and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0062] Embodiment 1: A kind of preparation method of polyester film for three-layer dry film resist

[0063] Include the following steps:

[0064] 1. Preparation of resorcinol modified fumed silica

[0065] Add two thirds of sulfolane of the total capacity of the autoclave into the high-pressure reactor, and add hydrophilic fumed silica powder with a particle size of 600nm and 7% of the mass of sulfolane at a stirring rate of 12,000 rpm. After the dispersion is uniform, add hydrophilic Resorcinol with a mass of 80% of the gas-phase silica powder is heated up to 170°C, pressurized to 16MPa, and reacted for 1.5 hours at a stirring rate of 12,000 rpm. After the pressure is released and the temperature is cooled to room temperature, the solid is separated by centrifugation. Rinse with absolute ethanol for 3 times and then vacuum dry at 40°C to obtain modified fumed silica;

[0066] 2. Preparation of isophthalic acid modified PET resin masterbatch

[0067] Grind slices of isopht...

Embodiment 2

[0089] Embodiment 2: A kind of preparation method of polyester film for three-layer dry film resist

[0090] Include the following steps:

[0091] 1. Preparation of resorcinol modified fumed silica

[0092] Add two thirds of sulfolane of the total capacity of the autoclave into the high-pressure reactor, and add hydrophilic fumed silica powder with a particle size of 300nm and 6% of the mass of sulfolane at a stirring rate of 10,000 rpm. After the dispersion is uniform, add hydrophilic Resorcinol with a mass of 75% of the gas-phase silica powder is heated up to 150°C, pressurized to 10MPa, and reacted for 1 hour at a stirring rate of 10,000 rpm. After the pressure is released and the temperature is cooled to room temperature, the solid is separated by centrifugation. Rinse with absolute ethanol for 3 times and then vacuum dry at 40°C to obtain modified fumed silica;

[0093] 2. Preparation of isophthalic acid modified PET resin masterbatch

[0094] Grind slices of isophthal...

Embodiment 3

[0116] Embodiment 3: A kind of preparation method of polyester film for three-layer dry film resist

[0117] Include the following steps:

[0118] 1. Preparation of resorcinol modified fumed silica

[0119] Add two thirds of sulfolane of the total capacity of the autoclave into the high-pressure reaction kettle, add hydrophilic fumed silica powder with a particle size of 1000nm and 8% of the mass of sulfolane at a stirring rate of 13000 rpm, and after the dispersion is uniform, add hydrophilic Resorcinol with a mass of 85% of the gas-phase silica powder is heated to 180°C, pressurized to 20MPa, and reacted for 2 hours at a stirring rate of 13,000 rpm. After the pressure is released and the temperature is lowered to room temperature, the solid is separated by centrifugation. Rinse with absolute ethanol for 3 times and then vacuum dry at 40°C to obtain modified fumed silica;

[0120] 2. Preparation of isophthalic acid modified PET resin masterbatch

[0121] Grind slices of is...

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Abstract

The invention provides a three-layer polyester film for a dry film resist and a preparation method thereof. The film is an A / B / C three-layer structure film which is integrally extruded and compounded, the total thickness is 14-16 microns, and the thickness ratio of the A, B and C layers is (6-12): (76-88): (6-12). B is a core layer and is made of pure PET resin. A and C are an outer surface layer and an inner surface layer and are both made of isophthalic acid modified PET resin containing (2-hydroxyethyl) triphenylphosphonium chloride and resorcinol modified fumed silica. The preparation method of the film comprises the steps of preparation of resorcinol modified fumed silica, preparation of isophthalic acid modified PET resin master batch and preparation of an A / B / C three-layer polyester film. The light transmittance of the obtained polyester is 91.02-91.33%, the haze is 1.81- 2.12%, the static friction coefficient is 0.37-0.50 microseconds, and the surface inherent resistance value ranges from 0.46 * 10 < 11 > omega to 0.51 * 10 < 11 > omega.

Description

technical field [0001] The invention relates to a polyester film for a three-layer dry film resist and a preparation method thereof, belonging to the technical field of films. Background technique [0002] Dry film resist, commonly known as dry film, is a photoresist material invented by DuPont of the United States in 1968. It is widely used in the microelectronics industry, such as electroplating and pattern etching in the manufacture of printed circuit boards. . The dry film has a three-layer structure. The middle layer (also called photoresist layer) is the main body, which is a photosensitive material layer (photoresist) with a thickness of tens to hundreds of microns; the inner layer is a PE protection layer with a thickness of 19-21 microns. Film, covered on the photoresist layer, prevents dust and dirt from contaminating the photosensitive material, and prevents each layer of photoresist from sticking to each other when rolling the film; the outer layer is a polyeste...

Claims

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Application Information

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IPC IPC(8): B32B27/36B32B27/08B32B27/18B32B33/00C08L67/02C08K7/26C08K5/50C08J5/18B29D7/01
CPCB32B27/36B32B27/08B32B27/18B32B33/00C08J5/18B29D7/01B32B2250/244B32B2307/412B32B2307/746B32B2307/21C08J2367/02C08K7/26C08K5/50
Inventor 叶世强王国明于涛周慧芝
Owner WEIFANG FUWEI PLASTIC