Process for preparing polyisocyanate composition by using recycled monomer
A technology of polyisocyanate and diisocyanate, which is applied in the field of preparation technology, can solve the problems of damp products, easy flocculation and precipitation, complicated operation, etc., and achieve the effect of solving difficult processing problems and excellent flocculation stability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0062] Under the condition of nitrogen protection, heat 1000g of fresh HDI monomer in a water bath at 60°C for 1h, add 0.5g of 2-hydroxy-N,N,N-trimethyl-1-propanamine formate Trimerization was carried out with n-butanol solution (0.62 mmol). When the NCO content in the reaction solution reached 39.3%, 0.16 g of di-n-butyl phosphate (0.76 mmol) was added to terminate the reaction. Next, it was purified twice using a thin film evaporator under the conditions of 150° C. and 0.2 Torr to obtain a polyisocyanate composition A having a HDI monomer mass concentration of 0.16% and about 600 g of recovered monomers. The acid value of the recovered monomer was tested to be 155mgKOH / 100g.
[0063] The above-mentioned 600g recovery monomer and 750mg KOH were mixed and stirred at room temperature for 60min, after 1um membrane filtration, the acid value of the test filtrate was 30mgKOH / 100g. The reclaimed monomer after treatment is mixed with 400g fresh HDI monomer, carry out trimerization...
Embodiment 2
[0065] Under nitrogen protection conditions, 1000g of fresh HDI monomer was heated in a 60°C water bath for 1h, and 0.25g of a 20% mass concentration of trimethylbenzyl ammonium hydroxide in n-butanol (0.30mmol) was added for trimerization. When the NCO content in the reaction solution reached 39.3%, 0.08 g of di-n-butyl phosphate (0.36 mmol) was added to terminate the reaction. Next, it was purified twice using a thin film evaporator under the conditions of 145°C and 0.2 Torr to obtain a polyisocyanate composition C with a HDI monomer mass concentration of 0.16% and about 600 g of recovered monomers. The acid value of the recovered monomer was tested to be 103mgKOH / 100g.
[0066] Above-mentioned 600g recovery monomer and 516mg KOH are mixed and stirred 60min at room temperature, after 1um membrane filter, test filtrate acid value is 17mgKOH / 100g. The reclaimed monomer after treatment is mixed with 400g of fresh HDI monomer, carry out trimerization reaction and prepare polyis...
Embodiment 3
[0068] Under the condition of nitrogen protection, heat 1000g fresh HDI monomer in 70°C water bath for 1h, add 2.0g n-butanol solution (1.17mmol) of (2-hydroxyethyl)triphenylphosphine chloride with a mass concentration of 20% carry out the trimerization reaction. When the NCO content in the reaction solution reached 39.3%, 0.179 g (1.4 mmol) of dimethyl sulfate was added to terminate the reaction. Next, it was purified twice using a thin film evaporator under the conditions of 140°C and 0.2 Torr to obtain a polyisocyanate composition E with a HDI monomer mass concentration of 0.20% and about 600 g of recovered monomers. The acid value of the recovered monomer was tested to be 95mgKOH / 100g.
[0069] The above-mentioned 600g recovery monomer and 546mg KOH were mixed and stirred at room temperature for 60min, after 1um membrane filtration, the test filtrate acid value was 4mgKOH / 100g. The treated recovered monomer was mixed with 400 g of fresh HDI monomer, and trimerization was...
PUM
| Property | Measurement | Unit |
|---|---|---|
| acid value | aaaaa | aaaaa |
| acid value | aaaaa | aaaaa |
| acid value | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com


