Cleaning method for removing plasma on surface of array type laminated semiconductor packaging lead frame
A technology for plasma cleaning machines and packaging leads, applied in cleaning methods and utensils, semiconductor/solid-state device manufacturing, chemical instruments and methods, etc., can solve problems such as prolonged processing time, discoloration, and board burning, and improve reliability and efficiency. Effect
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[0024] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific embodiments.
[0025] See figure 2 , 3 , 4, discloses a cleaning method for removing plasma from the surface of an arrayed, stacked semiconductor packaging lead frame, said method comprising:
[0026] Step 1. Put the material box (carrier) containing the lead frame of the multi-layer semiconductor package on the specially designed electrode bracket in the reaction chamber of the plasma cleaning machine, and close the reaction chamber of the plasma cleaning machine;
[0027] Step 2. Turn on the vacuum pump to allow the air pressure in the reaction chamber to reach a certain degree of vacuum;
[0028] Step 3. Turn on the flow meter and feed a certain amount of process gas until the vacuum degree maintains a dynamic balance.
[0029] Step 4. Turn on the pulse p...
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