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Method for improving white points on surface of metal film

A technology of metal thin film and white spots, applied in metal material coating technology, ion implantation plating, coating, etc., can solve the problems of white spots on the surface of metal films to reduce reflectivity, etc.

Pending Publication Date: 2022-04-19
重庆四联特种装备材料有限公司
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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for improving white spots on the surface of metal films, aiming at solving the problem of excessive white spots on the surface of existing metal films and reducing reflectivity

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  • Method for improving white points on surface of metal film
  • Method for improving white points on surface of metal film
  • Method for improving white points on surface of metal film

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Embodiment Construction

[0026] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0027] The present invention adopts ZZS-1600 vacuum coating machine and plasma-assisted physical vapor deposition method to coat the process.

[0028] see Figure 1 to Figure 4 , the invention provides a method for improving white spots on the surface of a metal film, comprising:

[0029] S101 uses absolute ethanol, ether and calcium carbonate to clean the substrate;

[0030] The specific steps are:

[0031] S201 Wipe the substrate with a 1:3 mixture of absolute ethanol and ether dipped in calcium carbonate;

[0032] Material...

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Abstract

The invention relates to the field of optical elements, in particular to a method for improving white dots on the surface of a metal film, which comprises the following steps: cleaning a substrate by using absolute ethyl alcohol, diethyl ether and calcium carbonate; sequentially depositing a Cr bonding layer and a Cu reflecting layer on the substrate by using a plasma-assisted PVD (Physical Vapor Deposition) method; and depositing a SiO2 protective layer on the Cu reflecting layer. Firstly, a bonding layer is deposited, the bonding force between a substrate and a Cu or Al film is increased, and ion source bombardment is adopted during deposition of the Cu or Al film, so that protrusions of the metal film layer are flattened, the surface quality of the metal film layer is better, the number of white points is effectively reduced, and the reflectivity of the metal film layer is improved. And a layer of oxide hard protective film is plated outside the metal film, so that the hardness of the reflecting film is increased, and the reflecting film is ensured to pass an environmental test.

Description

technical field [0001] The invention relates to the field of optical elements, in particular to a method for improving white spots on the surface of a metal thin film. Background technique [0002] Due to its high reflectivity in the visible region to the infrared region, the pure metal film can meet the common requirements for the mirror of optical instruments. However, in some applications, the reflectivity of the reflector is required to be extremely high, the surface type including PV and RMS is extremely small, and a variety of harsh environmental test requirements are required. In order to meet the requirements at this time, it is necessary to increase the surface of the metal film. protective film. This requires the surface of the metal film and its protective film to be smooth, with high bonding force and firmness, which can withstand the requirements of the national military standard. [0003] The surface of the conventional PVD-evaporated Al film and Cu film has ...

Claims

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Application Information

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IPC IPC(8): C23C14/02C23C14/10C23C14/18
CPCC23C14/025C23C14/10C23C14/021C23C14/18
Inventor 牛江伟席燕飞蒋肖
Owner 重庆四联特种装备材料有限公司
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