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38results about How to "Improve facial shape" patented technology

Optical imaging camera lens

PendingCN110412749AImprove camera clarityImprove powerOptical elementsCamera lensOptical axis
The invention discloses an optical imaging camera lens. The optical imaging camera lens comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens and an eighth lens along an optical axis in sequence from an object side to an image side. The first lens has positive focal power, wherein the object side face of the first lens is a convex face, andthe image side face of the first lens is a concave face. The second lens has negative focal power, wherein the image side face of the second lens is a concave face. The third lens has focal power, wherein the object side face of the third lens is a convex face, and the image side face of the third lens is a concave face. The fourth lens has focal power, the fifth lens has focal power, and the sixth lens has focal power. The seventh lens has positive focal power, wherein the object side face of the seventh lens is a convex face. The eighth lens has negative focal power, wherein the object sideface of the eighth lens is a concave face, and the image side face of the eighth lens is a concave face. The half length ImgH of the diagonal line of an effective pixel region on an imaging face of the optical imaging camera lens is larger than 5.80 mm, and the effective focal length f7 of the seventh lens and the total effective focal length f of the optical imaging camera lens meet the conditionthat f7/f is larger than 1.00 and smaller than 2.00.
Owner:ZHEJIANG SUNNY OPTICAL CO LTD

Rapid environment-friendly double-sided polishing method for silicon wafer substrate

The invention relates to the technical field of ultra-precision machining of semiconductors, in particular to a rapid environment-friendly double-sided polishing method for a silicon wafer substrate. The rapid environment-friendly double-sided polishing method for a silicon wafer substrate comprises the following steps: (1) rough polishing: carrying out chemical mechanical polishing on a silicon wafer substrate by using a rough polishing solution, wherein the rough polishing solution is prepared from cerium oxide, deionized water, a dispersing agent and a pH adjusting agent; (2) fine polishing: carrying out chemical mechanical polishing on the silicon wafer substrate subjected to rough polishing by using a fine polishing solution, wherein the fine polishing solution is prepared from cerium oxide, deionized water and a dispersing agent. According to the polishing method, a two-step chemical mechanical polishing method is adopted, cerium oxide polishing solutions with different particle sizes, different polishing pads and different pH conditions are adopted, the pressure of a polishing disc and the rotation speed ratio of a center gear are controlled, the polishing efficiency of the silicon wafer substrate can be effectively improved, the average thickness difference of the polished substrate is small, and the bending warping degree is low.
Owner:广西立之亿新材料有限公司

A type III personalized functional appliance

The invention discloses an III type appliance with a personalized function as well as a manufacture method and an application of the III type appliance. The III type appliance with the personalized function comprises a maxillary outer side base 1, a maxillary tongue side base 2, an occlusal pad 3, a mandible outer side base 4 and a mandible tongue side base 5, wherein the maxillary outer side base 1 and the maxillary tongue side base 2 are integrally connected through the occlusal pad 3 to form an upper tooth space 6, and the mandible outer side base 4 and the mandible tongue side base 5 are integrally connected through the occlusal pad 3 to form a lower tooth space 7. The III type appliance with the personalized function can promote growth of maxilla and inhibit growth of mandible, and the purpose of preventive or interruptive correction of functional III type malocclusion or mild bony III type malocclusion is achieved; correction is completed under the condition that tooth extraction for subtrahend is not adopted, the conditions that the front section of the upper dental arch becomes narrower and the side face of the upper dental arch is more umbilicate can be avoided, reverse occlusion of anterior teeth can be corrected, space is regained, dentition is aligned, the face shape is improved, and the III type appliance with the personalized function has a good application prospect.
Owner:STOMATOLOGY AFFILIATED STOMATOLOGY HOSPITAL OF GUANGZHOU MEDICAL UNIV

A type II personalized functional appliance and its manufacturing method and application

The invention discloses an II type appliance with a personalized function as well as a manufacture method and an application of the II type appliance. The II type appliance with the personalized function comprises a maxillary outer side base 1, a maxillary tongue side base 2, an occlusal pad 3, a mandible outer side base 4 and a mandible tongue side base 5, wherein the maxillary outer side base 1 and the maxillary tongue side base 2 are integrally connected through the occlusal pad 3 to form an upper tooth space 6, and the mandible outer side base 4 and the mandible tongue side base 5 are integrally connected through the occlusal pad 3 to form a lower tooth space 7. The II type appliance with the personalized function can promote growth of mandible and inhibit growth of maxilla, and the purpose of preventive or interruptive correction of functional II type malocclusion or mild bony II type malocclusion is achieved; correction is completed under the condition that tooth extraction for subtrahend is not adopted, the conditions that the front section of the upper dental arch becomes narrower and the side face of the upper dental arch is more umbilicate can be avoided, reverse occlusion of anterior teeth can be corrected, space is regained, dentition is aligned, the face shape is improved, and the II type appliance with the personalized function has a good application prospect.
Owner:STOMATOLOGY AFFILIATED STOMATOLOGY HOSPITAL OF GUANGZHOU MEDICAL UNIV

Method for correcting class II occlusion malformation

The embodiment of the invention discloses a bony class-II malformation correction method which comprises the following steps: quickly aligning teeth by adopting a multi-effect nickel-titanium arch wire, adducting anterior teeth by utilizing an anchorage nail and a constant-force tension spring, distally erecting upper posterior teeth, leveling a lower jaw spee curve, rotating a mandible anticlockwise, stretching a mandible chin forwards, reducing the heights of the upper posterior teeth and the lower posterior teeth, and promoting the mandible to rotate anticlockwise. And the lower anterior teeth are erected on the basal bone and are simultaneously depressed. In the later treatment period, when the upper anterior teeth reach the standard position, the lower mandibular anterior teeth are fully erected in the basal bone, but the anterior teeth cover a large area, a TMA wire is used for bending and raising in cooperation with oblique guiding and (or) the lower mandibular to conduct short-distance II-type traction, a rear tooth occlusion relation is established, the lower mandibular bone is promoted to move forwards, and the face of a II-type patient is improved. According to the invention, complicated operations such as operations are not needed, the orthopedic II-type correction of adults can be completed, and the facial forms of maxillary protrusion and mandibular retrograde can be effectively improved.
Owner:北京非凡禾禾医疗器械有限公司
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