Three-dimensional fan-out wafer level packaging method and packaging structure
A wafer-level packaging, fan-out technology, applied in the manufacturing of electrical components, electric solid-state devices, semiconductor/solid-state devices, etc., can solve the problems of high cost, high technology and equipment, and achieve simple process technology, short process, The effect of low production cost
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[0041] Example 1
[0042] The present invention provides a three-dimensional fan-out wafer-level packaging method and packaging structure, for convenience in description, the following is described in a single chip 401 package above the wafer 402, such as Figure 1 as shown.
[0043] The present invention provides a three-dimensional fan-out wafer level packaging method, comprising the following steps:
[0044] Offers such as Figure 2 The IC wafer shown, by seed layer deposition, electroplating process in the chip pin position to produce chip copper column bump 202, the chip copper column bump height >3μm, structure such as Figure 3 shown;
[0045] The IC wafer is split into a single bare chip 201 by mechanical cutting or dry etching, e.g Figure 4 shown;
[0046] Providing a glass carrier plate 301, the surface of the glass carrier plate 301 is successively coated with a temporary bonding laser reaction layer 302 and a temporary bonding adhesive 303; wherein the thickness of the g...
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[0058] Example 2
[0059] The present invention provides a three-dimensional fan-out wafer-level packaging method that enables multi-layer stacking; the specific steps are as follows:
[0060] Offers such as Figure 2 The IC wafer shown, by seed layer deposition, electroplating process in the chip pin position to produce chip copper column bump 202, the chip copper column bump height >3μm, structure such as Figure 3 shown;
[0061] The IC wafer is split into a single bare chip 201 by mechanical cutting or dry etching, e.g Figure 4 shown;
[0062] Providing a glass carrier plate 301, the surface of the glass carrier plate 301 is successively coated with a temporary bonding laser reaction layer 302 and a temporary bonding adhesive 303; wherein the thickness of the glass carrier plate 301 is more than 100μm, the thickness of the temporary bonding adhesive 303 is more than 1μm, the thickness of the temporary bonding laser reaction layer 302 is more than 0.1μm, the structure is as follo...
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