Multi-cavity PVD-RTA mixed film deposition system
A PVD-RTA, thin film deposition technology, applied in the field of ion sputtering deposition system, can solve the problem of not being able to give full play to the role of RTA, reduce equipment use and maintenance costs, reduce temperature requirements, and improve the effect of thin film crystal structure
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Referring to Fig. 1 to Fig. 6, the embodiment of the multi-chamber PVD-RTA hybrid film deposition system of the present invention is further explained
The device or element must have a specific orientation, be constructed and operated in a specific orientation, and should not be construed as limiting the specific warranty of the present invention.
One or more of the features, in the description of the present invention, "several" and "several" mean two or more, unless otherwise
Fig. 1 is the structural representation of multi-chamber PVD-RTA hybrid film deposition system of the present invention;
[0048] The transport cavity 1 is provided with a manipulator 11 inside;
[0049] The loading cavity 2 is arranged beside the transport cavity 1, and is provided with a first vacuum valve between the transport cavity 1, and
[0050] The process chamber includes a thin film deposition chamber 31, an etching chamber 32 and a vacuum fast chamber distributed beside the transport chamber...
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