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FinFET device performance prediction and structure optimization method based on neural network

A neural network and performance prediction technology, applied in neural learning methods, biological neural network models, neural architectures, etc., can solve problems such as time-consuming, low efficiency, and difficulty in satisfying diversification, and achieve the effect of solving long development cycles

Pending Publication Date: 2022-06-24
XIDIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the traditional methods of researching and developing new devices and new materials have the problems of long time-consuming, high cost, high threshold and low efficiency, making it difficult to meet diverse needs

Method used

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  • FinFET device performance prediction and structure optimization method based on neural network
  • FinFET device performance prediction and structure optimization method based on neural network
  • FinFET device performance prediction and structure optimization method based on neural network

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Experimental program
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Effect test

Embodiment 1

[0031] The performance prediction method of FinFET device based on neural network includes the following steps:

[0032] Step 1, obtaining the structural parameters of 4077 groups of FinFET devices and their corresponding electrical performance parameters as a sample set;

[0033] The structural parameters of the FinFET device include Fin width, Fin height, Gaussian doping concentration in the source region, Gaussian doping concentration in the drain region, and channel length; the electrical performance parameters of the FinFET device include DC characteristic parameters and AC characteristic parameters. The characteristic parameters include threshold voltage, average subthreshold swing, transconductance and current switching ratio, and the AC characteristic parameter is the cut-off frequency;

[0034] That is, each set of data includes Fin width, Fin height, Gaussian doping concentration of source region, Gaussian doping concentration of drain region, channel length, thresho...

Embodiment 2

[0069] The structure optimization method of FinFET device based on neural network includes the following steps:

[0070] Step 1, obtaining electrical performance parameters of multiple groups of FinFET devices and their corresponding structural parameters as a sample set;

[0071] The electrical performance parameters of the FinFET device include DC characteristic parameters and AC characteristic parameters, the DC characteristic parameters include threshold voltage, average sub-threshold swing, transconductance and current switching ratio, and the AC characteristic parameter is the cutoff frequency; FinFET device The structural parameters include Fin width, Fin height, source Gaussian doping concentration, drain Gaussian doping concentration and channel length;

[0072] That is, each set of data includes Fin width, Fin height, Gaussian doping concentration in the source region, Gaussian doping concentration in the drain region, channel length, threshold voltage, subthreshold ...

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Abstract

The invention relates to the technical field of microelectronic devices and artificial intelligence, in particular to an Fi nFET device performance prediction and structure optimization method based on a neural network. According to the invention, the neural network is used to learn the relationship between the Fi nFET device structure and the electrical performance, so that the electrical performance of the Fi nFET device can be quickly predicted according to the Fi nFET device structure, and the optimized Fi nFET device structure can be obtained according to the electrical performance of the Fi nFET device. The problems that a traditional numerical simulation method is long in development period, low in efficiency and high in cost are well solved, and the requirement for rapid development of the Fi nFET device is met.

Description

technical field [0001] The invention relates to the field of microelectronic device technology and artificial intelligence technology, in particular to a FinFET (FinField-Effect Transistor, fin field effect transistor) device performance prediction and structure optimization method based on a neural network. Background technique [0002] With the continuous reduction of the feature size of the device, especially after entering the nano era, the non-ideal effects in field effect transistors, such as short channel effect, quantum effect, parasitic effect and parameter instability, have an increasing impact on device performance. In particular, the further reduction of the device is severely restricted by the device structure, material and working mechanism. FinFET devices can not only suppress short-channel effects and improve sub-threshold characteristics by enhancing gate control capabilities, but also have the advantage of being compatible with traditional processes. [00...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/17G06F30/27G06N3/04G06N3/08G06F119/02
CPCG06F30/17G06F30/27G06N3/084G06F2119/02G06N3/045
Inventor 王树龙刘海宇赵银锋刘晨钰赵蓉马兰马浩
Owner XIDIAN UNIV