Film type electrostatic chuck with pressure sensing function

Abstract

The invention relates to the technical field of electrostatic chucks, in particular to a film type electrostatic chuck with a pressure sensing function. The device comprises an electrostatic chuck, an interference shielding film and a pressure sensor. The electrostatic chuck and the pressure sensor are arranged on the interference shielding film, and the electrostatic chuck and the pressure sensor are located on the two sides of the interference shielding film respectively. Carrying out multiple designs and selecting an optimized circuit diagram by utilizing calculation software matched with parameters and algorithms of materials; photoetching and drilling are carried out on the thin film; and electroplating and plating nickel and gold on the thin film with the circuit, and finally plating a layer of indium compound to form the interference shielding film. According to the invention, the electrostatic chuck has a pressure measurement capability at the same time, technological parameters are adjusted through real-time data feedback so as to improve the yield, the device is more intelligent, and the quality is effectively improved; the electrostatic chuck can be protected, and the service life of the film type electrostatic chuck is prolonged; it can be confirmed that the film type electrostatic chuck can correctly suck a target object, and normal operation is ensured.

Description

technical field [0001] The invention relates to the technical field of electrostatic chucks, in particular to a film-type electrostatic chuck with pressure sensing function. Background technique [0002] The electrostatic adsorption technology used by the electrostatic chuck is an advantageous technology that replaces the traditional mechanical clamping and vacuum adsorption methods. It is widely used in semiconductor, panel display, optics and other fields. [0003] At present, thin-film electrostatic chucks have been widely used in display industries such as semiconductor wafer processing, liquid crystal panels and AMOLED panels. However, due to the inability to integrate well with pressure sensors, it is impossible to timely feedback pressure changes. The sensor is very sensitive to the interference of noise and electromagnetic waves, so the electrostatic chuck is easy to interfere with the pressure sensor, which makes it impossible to synchronously adjust the equipment a...

AI Technical Summary

Problems solved by technology

[0003] At present, thin-film electrostatic chucks have been widely used in display industries such as semiconductor wafer processing, liquid crystal panels, and AMOLED panels. The sensor is very sensitive to noise and electromagnetic wave interference, so the electrostatic chuck is easy to cause interference to the pressure sensor, resulting in the inability to make synchronous adjustments to the equipment and process to improve the yield and achieve optimization

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