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Nano structure of Fesi2 and prepartion method

A technology of nanostructures and nanoribbons, applied in the field of FeSi2 nanostructures and its preparation, can solve the problems of Fe-Si nanomaterials and nanostructures that have not been reported in the literature

Inactive Publication Date: 2005-11-16
TSINGHUA UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

About metallic α-FeSi 2 There are few reports on the application research, only Lin et al. have studied the α-FeSi induced by ions on silicon wafers at low temperature. 2 epitaxial growth, and it has been suggested that metallic silicides be used to make silicon-based electrical connections
So far, the application research of Fe-Si materials is mainly based on high-quality large single crystals and thin films, while the preparation and application of Fe-Si nanomaterials and nanostructures have not been reported in the literature.

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  • Nano structure of Fesi2 and prepartion method
  • Nano structure of Fesi2 and prepartion method
  • Nano structure of Fesi2 and prepartion method

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Embodiment Construction

[0024] Below in conjunction with embodiment the present invention is described in further detail.

[0025] figure 1 A microwave plasma chemical vapor deposition system for preparing this nanostructure. figure 1 Among them, 1 is the microwave source, 2 is the mechanical pump, 3 is the rectangular waveguide, 4 is the quartz tube, 5 is the nitrogen source, 6 is the anhui gas source, 7 is the ceramic holder, 8 is the ceramic boat, 9 is the silicon wafer, and 10 is the Ferrocene powder.

[0026]The microwave frequency of the system is 2.45GHz, and the maximum power is 1kW. A quartz tube with an inner diameter of 42mm passes vertically through a rectangular waveguide as a plasma tube, a P-type (100) silicon wafer with a resistivity of 10-20Ωcm is used as a silicon source and substrate, ferrocene is used as an iron source, and nitrogen gas with a purity of 99.99% is used as a plasma Excitation gas, CH with a purity of 99.99% 4 Gas is the auxiliary gas. The deposition pressure is...

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Abstract

A FeSi2 nano-band features that it is growing on the surface of Si crystal in perpendicular tow direction to generate the reticular nano-structure by self configuration. Its preparing process includes such steps as using TE10-mode microwave to generate a special electromagnetic field in the reaction cavity in a squar waveguide, magnetizing the Fe nanoparticle custer deposited on Si substrate while magnetically driving the Fe nanoparticles for growing by self configuration on the Si substrate, and reacting on Si substrate to form FeSi2 nanoband and nano-structure.

Description

technical field [0001] a FeSi 2 A nanostructure and a preparation method thereof belong to the fields of microelectronic devices, nanoelectronic devices and optoelectronic devices. Background technique [0002] Since the discovery of carbon nanotubes, one-dimensional nanomaterials have received extensive attention. So far, many kinds of one-dimensional nanomaterials have been synthesized, including nanotubes (such as BN, WS 2 , B x C y N z ,MoS 2 ), nanorods (such as SiC, Si 3 N 4 ), nanowires (such as Si, Ge, GaN, GaAs), nanoribbons (such as ZnO, MoO 3 , Ge 3 N 4 )wait. These one-dimensional nanomaterials have excellent optical, electrical, magnetic, and mechanical properties and are expected to find wide applications in the field of nanotechnology. However, although one-dimensional nanomaterials have made great progress, there are still many difficulties in their practical application. For example, the currently prepared nanomaterials often have to go through p...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B1/00
Inventor 许北雪沈德忠吴锦雷沈光球
Owner TSINGHUA UNIV