Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for producing cuprous chloride form deposed copper chloride fluid of etching board

A technology of cuprous chloride and cupric chloride, applied in the direction of cupric chloride, cupric halide, etc., can solve the problems of increasing environmental protection treatment burden, low market demand for cupric chloride dihydrate and high treatment cost, so as to solve the problem of processing etching The difficulty of waste liquid, saving copper resources and water resources, and the effect of not producing secondary pollution

Active Publication Date: 2005-11-16
RUANSHI CHEM WUJIANG CITY
View PDF1 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The first is the most direct and simplest treatment method, but the benefit is poor. Because the waste liquid contains a large amount of hydrochloric acid, a considerable amount of iron is wasted in vain, resulting in serious waste; the second is to jointly treat the two waste liquids, but Gained product purity is low, and processing cost is higher; The 3rd kind consumes a lot of energy in the concentration process, and has a large amount of hydrochloric acid to volatilize, both pollutes environment and causes loss again, and the market demand of gained copper chloride dihydrate is few; The 3rd Four kinds are as described in patent 94113822.4. First, the waste copper chloride etching solution and scrap iron are directly replaced to produce copper powder, then water is added to reduce the acid and purified, and the obtained copper powder is reacted with copper chloride etching solution to form cuprous chloride. , due to the need for a large amount of water in the process of generating copper powder, and the hydrolysis of the cuprous chloride complex requires 4-6 times the volume of water, resulting in a great consumption of water resources, and a large amount of water produced in this process Iron-containing waste liquid has increased the burden of environmental protection treatment
[0003] Japanese patent J56155020-A discloses a production method of cuprous oxide, the content of which is: when the copper chloride aqueous solution is eroded to treat the copper plate, the waste liquid discharged is converted into the cuprous chloride aqueous solution, and then the aqueous solution and the alkali solution Simultaneously inject the reactor species, react and generate cuprous oxide under the condition of pH value 8.5-12.5, this method comprises multiple steps, wherein relates to the conversion of waste cupric chloride etching liquid to cuprous chloride, but chlorination Cuprous copper exists in a complex state. If you want to get cuprous chloride products, you need a lot of water. The steps are cumbersome and cause a waste of resources.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Use copper oxide mud or the copper produced in the above step (4) to adjust the pH value to 1 with the source waste copper chloride etching plate liquid, and measure the copper ion concentration to be 115 grams per liter, filter to remove insoluble substances, and heat the filtrate to a constant temperature of 70°C Stir, continuously feed sulfur dioxide gas into the filtrate, control the pressure of the sulfur dioxide gas cylinder to be 0.02Mpa, after 35 minutes, the solution turns from green to light brown, stop passing the sulfur dioxide gas, and cool the solution to form crystals and mother liquor, the produced trioxide The sulfur gas is absorbed by the sodium carbonate solution to obtain the by-product sodium sulfate solution.

[0022] Filter and separate the cuprous chloride crystals and the mother liquor, wash the cuprous chloride crystals with dilute hydrochloric acid with pH=1 and ethanol respectively, dry at 80°C for 25 minutes, and then seal and package. The m...

Embodiment 2

[0024] Use copper oxide mud to adjust the pH value of the source waste copper chloride etching solution to 1.5, measure the copper ion concentration to be 120 g / L, and filter to remove impurities to obtain a clear solution. The obtained clear solution was heated to 73°C with constant temperature stirring, and sulfur dioxide gas was continuously introduced into the clear solution, and the pressure of the sulfur dioxide gas cylinder was controlled to be 0.03Mpa. After 30 minutes, the solution changed from green to yellow, and the sulfur dioxide gas was stopped, and the solution was stirred. After cooling, cuprous chloride crystals and mother liquor are formed, and the sulfur trioxide gas generated during this process is absorbed with sodium carbonate solution to obtain sodium sulfate solution as a by-product.

[0025] Filter and separate the cuprous chloride crystals and the mother liquor, wash the cuprous chloride crystals with dilute hydrochloric acid and ethanol at PH=1, dry a...

Embodiment 3

[0027] The copper oxide mud and the copper mud produced in the above step (4) are used to adjust the pH value to 1 with the source waste copper chloride etching plate liquid, and the measured copper ion concentration is 125 grams per liter, and the insoluble matter is removed by filtration to obtain a clarified filtrate. Heat the clarified filtrate to 75°C and stir at a constant temperature, continuously feed sulfur dioxide gas into the clarified filtrate, control the pressure of the sulfur dioxide gas cylinder to 0.04Mpa, and after 35 minutes, the solution changes from green to light brown, stop feeding the sulfur dioxide gas, and cool the solution to obtain The mother liquor and the cuprous chloride precipitated in the mother liquor are crystallized, and the sulfur trioxide gas generated in the process is absorbed with sodium carbonate solution to obtain a by-product sodium sulfate solution.

[0028] After filtering, washing the obtained cuprous chloride crystals with dilute ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A process for preparing cuprous chloride from the used etching liquid of copper chloride includes adding copper oxide to said used etching liquid, filtering, heating the clear solution, stirring while filling SO2 gas, cooling, filtering to obtain crystals, washing with diluted hydrochloric acid and then with alcohol, and drying.

Description

technical field [0001] The invention relates to a treatment method of waste copper chloride etching liquid, in particular to a method for producing cuprous chloride by using waste copper chloride etching liquid. Background technique [0002] Existing waste copper chloride etching liquid usually has four processing methods: one is to replace copper powder with waste copper chloride etching liquid and scrap iron; the second is to use waste copper chloride etching liquid and copper The ammonia etching liquid is used at the same time to produce copper sulfate; the third is to use the waste copper chloride etching liquid to directly evaporate, concentrate and crystallize to produce copper chloride dihydrate; the fourth is to use copper powder to reduce the copper chloride etching liquid to produce chlorine Cuprous oxide. The first is the most direct and simplest treatment method, but the benefit is poor. Because the waste liquid contains a large amount ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01G3/05
Inventor 阮玉根
Owner RUANSHI CHEM WUJIANG CITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products