Unlock instant, AI-driven research and patent intelligence for your innovation.

High integration analysis chip of minimized height for reactor and application

一种分析芯片、反应器的技术,应用在分析材料、通过电磁手段进行材料分析、仪器等方向,能够解决构造复杂、工业化生产难度大等问题,达到成本昂贵的效果

Inactive Publication Date: 2010-12-22
CHENGDU KUACHANG SCI & TECH CO LTD
View PDF15 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages are: 1) In the production process, it is necessary to etch the microchannel first, point the probe, and then make the microchannel seal. Control, such as electroosmotic devices, etc.; 3) After the reaction is completed, because the fixed probe molecules are on the inner surface, for some detections such as fluorescent marker detection, the results cannot be directly read by ordinary chip scanners
[0017] With the introduction of high-density reactor chips, an important but often overlooked problem in its application is: if only m reactors are used in an experiment, and there are n reactors on the chip (n>m), How to protect the other n-m reactors for future experiments
It is very strange that for the multi-reactor chip, there is no special protection structure placed on the reactor chip at present, and the protection system of the above-mentioned single-reactor chip is still used

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High integration analysis chip of minimized height for reactor and application
  • High integration analysis chip of minimized height for reactor and application
  • High integration analysis chip of minimized height for reactor and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0119] Example 1: Preparation and Application of Highly Hydrophobic Isolation Structure Analysis Chip

[0120] In this example, the highly hydrophobic liquid materials used are "polyacrylate paint" (provided by Chengdu Chenguang Chemical Design Institute, China, static water contact degree of 85 degrees), "organic silicon waterproof coating" (provided by Chengdu Chenguang Chemical Design Institute, China) , static water contact degree 116 degrees), "ultra-high hydrophobic latex paint" (provided by Chengdu Chenguang Chemical Design Institute, China, static water contact degree 123 degrees) and "highly hydrophobic silicon oxide paint" (provided by China Zhoushan Mingri Nanomaterials Company, static The water contact degree is 151 degrees), and the high hydrophobic solid materials used are "polytetrafluoroethylene self-adhesive tape" (provided by China Chengdu Chenguang Chemical Design Institute, static water contact degree 117 degrees) and "nano textiles" (China Zhoushan Tomorrow...

Embodiment 2

[0132] Example 2: Preparation and application of water-absorbing isolation structure analysis chip

[0133] In this example, the water-absorbing materials used are "starch grafted acrylic acid water-absorbing film (thickness 80-100μm, water absorption rate 450g / g, provided by Chenguang Chemical Design Institute)", "absorbent paper (thickness 80-100μm, water absorption rate 150g / g g, provided by Chenguang Chemical Design Institute)" and "chitosan grafted acrylonitrile water-absorbing film (thickness 80-100μm, water absorption 220g / g, provided by Chenguang Chemical Design Institute)". Although the isolation structure of the reactor of the present invention may be partially or entirely the water-absorbing isolation structure of the present invention, only the simplest case is given as an example in this example.

[0134] 1) Preparation of water-absorbing isolation structure sheet base

[0135] The above-mentioned water-absorbing solid material is punched out with a diameter of 3...

Embodiment 3

[0140] Example 3: Preparation and application of a blank isolation structure analysis chip

[0141] In this example, the hydrophobic materials used are "black polyacrylate paint" (provided by Chengdu Chenguang Chemical Design Institute, China, static water contact degree of 78 degrees) and "black paint" (provided by Chengdu Chenguang Chemical Design Institute, China, static water contact degrees 76 degrees). The substrate used was epoxy-based glass slides. Although the isolation structure of the reactor of the present invention may be partially or entirely the blank isolation structure of the present invention, only the simplest case is given as an example in this example.

[0142] 1) Preparation of a blank isolation structure substrate with marking lines

[0143] The above-mentioned hydrophobic material is coated on the border of the reactor on the epoxy-based glass slide to form a black marking line with a height of 30-40 μm and a width of 500-1000 μm. On the surface of t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for analyzing multi-reactor chip, comprises at least one of the following steps: A. increasing the viscosity of the remainder of the reaction quantitatively; B. removing and washing the remainder of the reaction simultaneously; C. weakening the background signal using the high absorbance structure out of the chip; and the step C can also be replaced by the step D: enhancing the background signal using the illuminant and / or reflecting structure out of the chip. The invention also relates to a device for analyzing said multi-reactor chip, comprises at least oneof the following functional systems: A. system for increasing the viscosity of the remainder of the reaction quantitatively; B. system for removing and washing the remainder of the reaction simultaneously; C. system for weakening the background signal using the high absorbance structure out of the chip; and the system C can also be replaced by the system D: system for enhancing the background signal using the illuminant or / and reflecting structure out of the chip. The system C and the system D may be mounted at the same device and be used alternatively.

Description

technical field [0001] The present invention relates to analytical chips, in particular multi-reactor chips. More specifically, the present invention relates to a highly integrated analysis chip with minimized reactor height and its application. Background technique [0002] Analysis chip, referred to as chip, has a wide range of applications, including gene expression detection, gene screening, drug screening, disease diagnosis and treatment, environmental monitoring and governance, judicial identification and other fields. [0003] The core of the chip is the reactor on it, while the chip with markers also includes its labeling system. The most important three parts in the chip reactor are the probe array, sheet base and reactor structure. Probe arrays are usually formed by immobilizing the probes used in the analysis of polypeptides and nucleic acids on the surface of the substrate through spotting, spray printing, etc. The substrate is mainly a rectangular, circular o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N33/50G01N33/552G01N33/543G01N33/68C12Q1/68G01N27/00
Inventor 邹方霖陈春生陈宁王建霞
Owner CHENGDU KUACHANG SCI & TECH CO LTD