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Color filter black matrix resist composition

A technology of black matrix and photosensitive composition, which is applied in the field of photosensitive composition, and can solve problems such as damage to storage stability, inaccessibility of radiated light, and failure to obtain sufficient energy to initiate polymerization, etc.

Inactive Publication Date: 2006-01-25
RESONAC HOLDINGS CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, certain types of compounds or additives having ethylenically unsaturated bonds cause the following problems: (1) insufficient energy to initiate polymerization is obtained, (2) storage stability is not obtained, (3) the target cured product The thickness of the irradiated light cannot reach a sufficient depth, resulting in insufficient curing, (4) the part of the photosensitive composition in contact with the atmosphere is inhibited by oxygen, etc.
However, there is a problem in these techniques that the storage stability is damaged by the attempt to achieve high sensitivity with the polyfunctional thiol

Method used

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  • Color filter black matrix resist composition
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0180] Synthesis Example 1: Synthesis of Acrylic Copolymer (AP-1) with Carboxyl Groups

[0181] In a four-necked flask equipped with a dropping funnel, a thermometer, a condenser and a stirrer, 37.5 parts by mass of methacrylic acid (MA), 19.0 parts by mass of methyl methacrylate (MMA), 18.5 parts by mass of methacrylic acid n-butyl ester (BMA), 0.75 parts by mass of 2-mercaptoethanol, and 225.0 parts by mass of propylene glycol methyl ether (PGM), and the inside of the four-necked flask was purged with nitrogen for 1 hour. In addition, the temperature was raised to 90°C in an oil bath, and then 37.5 parts by mass of MA, 19.0 parts by mass of MMA, 18.5 parts by mass of BMA, 0.75 parts by mass of 2-mercaptoethanol, 225.0 parts by mass of PGM and 3.2 parts by mass of A mixture of 2,2'-azobisisobutyronitrile (AIBN). After the polymerization was carried out for 3 hours, the mixture was heated to 100° C. and a mixture of 1.0 parts by mass of AIBN and 15.0 parts by mass of propylen...

Embodiment 2

[0182] Synthesis Example 2: Synthesis of Carboxyl Acrylic Copolymer (AP-2)

[0183] In a four-necked flask equipped with a dropping funnel, a thermometer, a condenser and a stirrer, 17.5 parts by mass of MA, 30.0 parts by mass of MMA, 7.5 parts by mass of benzyl methacrylate (BzMA), 20.0 parts by mass of methyl 2-hydroxyethyl acrylate (HEMA), 0.75 parts by mass of 2-mercaptoethanol, and 225.0 parts by mass of PMA, and the inside of the four-necked flask was purged with nitrogen. Moreover, the temperature was raised to 90° C. in an oil bath, and then 17.5 parts by mass of MA, 30.0 parts by mass of MMA, 7.5 parts by mass of BzMA, 20.0 parts by mass of HEMA, 0.75 parts by mass of 2-mercaptoethanol, 225.0 parts by mass of A mixture of parts PMA and 3.2 parts by mass AIBN. After the polymerization was carried out for 3 hours, the mixture was heated to 100°C and a mixture of 1.0 parts by mass of AIBN and 15.0 parts by mass of PMA was added, and then polymerization was further carri...

Embodiment 3

[0184] Synthesis Example 3: Synthesis of Dispersant (DP-1)

[0185]In a four-necked flask equipped with a reflux condenser, a thermometer, a stirrer and a dropping funnel, 40 parts by mass of cyclohexanone was charged and the liquid temperature was kept at 100°C. Under a nitrogen atmosphere, 12 parts by mass of NKEster M-20G (methoxydiethylene glycol methacrylate) manufactured by Shin-Nakamura Chemical Co., Ltd., 4 parts by mass of Toa Gosei Macromonomer AA-6 (methyl methacrylate macromer) manufactured by Co., Ltd., 8 parts by mass of Light Ester DQ-100 (dimethylaminoethyl methacrylate) manufactured by Kyoeisha Chemical Co., Ltd. , quaternized product), 16 parts by mass of Light Ester DM (dimethylaminoethyl methacrylate) manufactured by Kyoeisha Chemical Co., Ltd., 0.4 parts by mass of n-dodecylmercaptan, 0.8 parts by mass of AIBN and A mixed solution composed of 20 parts by mass of cyclohexanone. After the dropwise addition was completed, another 0.5 parts by mass of AIBN w...

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Abstract

The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and / or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).

Description

[0001] Cross References to Related Applications [0002] This application is filed pursuant to 35 U.S.C. Section 111(a) and is claimed pursuant to U.S.C. Section 119(e)(1). Benefit of Provisional Application No. 60 / 435,284. technical field [0003] The present invention relates to a photosensitive composition for color filter black matrix photoresist, which contains branched polyfunctional thiol compound, and has high sensitivity and storage stability at the same time; Composition color filter black matrix photoresist composition. Background technique [0004] Photosensitive compositions are used in printing plates, color proofs, color filters, solder resists and photocurable inks, among many others. Especially in recent years, the main characteristics of photocuring - room temperature, fast drying, solvent-free properties, etc., have attracted attention from the perspectives of environmental protection, energy saving, work safety, production costs, etc., and a lot of rese...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G02F1/1335G03F7/004G02B5/00G02B5/20G03F7/027G03F7/028G03F7/031
CPCC08K5/3472C08K5/37G02F1/133512G03F7/0007G03F7/0275G03F7/031
Inventor 镰田博稔上条正直大西美奈
Owner RESONAC HOLDINGS CORPORATION