Method for manufacturing semi-transparent semi-reflective electrode substrate, reflective element substrate, method for manufacturing same, etching composition used for the method for manufacturing th
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- IDEMITSU KOSAN CO LTD
- Publication Date
- 2006-03-08
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for manufacturing a transflective and semireflective liquid crystal electrode substrate. It also relates to an etchant used in the manufacture of a transflective electrode substrate.
[0002] Also, the present invention relates to a reflective electrode substrate in a reflective liquid crystal or a light-emitting element, a method for producing the same, and an etching solution used in the method for producing the same. Background technique
[0003] One of the existing technologies (semi-transmissive and semi-reflective liquid crystal)
[0004] Hitherto, research and development of transflective liquid crystals have been vigorously conducted for the reasons described below.
[0005] (1) Since it is semi-transmissive and semi-reflective, a bright display can be obtained regardless of whether it is outdoors or indoors.
[0006] (2) When used in a bright place, it can be used as a reflection type, so power consumption ...