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Process for preparing super fine cerium oxide for polishing

A cerium oxide and cerium salt technology, applied in chemical instruments and methods, inorganic pigment processing, fibrous fillers, etc., can solve the problems of unsuitability for large-scale production, high price, no economic value, etc., and achieve good shape consistency, Low cost and small specific surface area

Inactive Publication Date: 2006-08-23
INNER MONGOLIA UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] Some of the above methods require high temperature and high pressure equipment, which are expensive and have no economic value for mass production; some are not suitable for mass production
The particle size is between 10nm and 3μm, and the specific surface area is less than 50m 2 / g of ultrafine cerium oxide polishing powder has not been reported yet

Method used

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  • Process for preparing super fine cerium oxide for polishing
  • Process for preparing super fine cerium oxide for polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] 2.2kg cerium carbonate (CeO 2 ≥45%) with 1.23LHNO 3 Dissolve, and add 5.48L deionized water to make solution A, add 29.7g polyethylene glycol to form solution B therein. Take 6.76L2.5mol / L of NH 4 HCO 3 into solution C. Then, under the condition of stirring, solution C is added dropwise to solution B. During the process of dropping, the pH value of the solution increases continuously. After solution C is dropped, the pH value of the reaction system is 6.5; at this time, a white Precipitate, and stir the precipitate for 0.2 hours to form suspension D. Take 2.86kg oxalic acid and make solution E with 19.1L deionized water. Then E was added dropwise to the suspension D. During the dropwise addition, the pH value of the solution decreased continuously. After the solution E was dropped, the pH value of the reaction system was 2.2. Continue stirring for 0.1 hour, filter the precipitate, and use Wash with ionized water for 3 to 4 times, then dry the precipitate in static...

Embodiment 2

[0033] 2.5kg Ce(NO 3 ) 3 ·6H 2 O and 4.80L of deionized water were made into solution A, to which 31.9g of polyethylene glycol was added to form solution B. Take 8.13L1.5mol / L of NaHCO 3 into solution C. Then, under the condition of stirring, solution C is added dropwise to solution B. During the process of dropping, the pH value of the solution increases continuously. After solution C is dropped, the pH value of the reaction system is 5.8; at this time, a white Precipitate, and stir the precipitate for 0.5 hours to form suspension D. Take 3.125kg oxalic acid and make solution E with 25L deionized water. Then E was added dropwise to the suspension D. During the dropwise addition, the pH value of the solution decreased continuously. After the solution E was dropped, the pH value of the reaction system was 2.5. Continue stirring for 0.2 hours, filter the precipitate, and use Wash with ionic water for 3 to 4 times, then dry the precipitate in static air at 800°C for 12 hour...

Embodiment 3

[0035] 0.8kg cerium oxide (CeO 2 ≥99%) with 1.00LHNO 3 Dissolve, and add 4.65L deionized water to make solution A, add 28g polyethylene glycol to form solution B therein. Take 4.67L of 3.0mol / L ammonia water to form solution C. Then, under the condition of stirring, solution C is added dropwise to solution B. During the dropping process, the pH value of the solution increases continuously. After solution C is dropped, the pH value of the reaction system is 7.5; at this time, brown Precipitate, and stir the precipitate for 0.2 hours to form suspension D. Take 1.08kg oxalic acid and make solution E with 5.4L deionized water. Then E was added dropwise to the suspension D. During the dropwise addition, the pH value of the solution decreased continuously. After the solution E was dropped, the pH value of the reaction system was 1.5. Continue stirring for 0.2 hours, filter the precipitate, and use Wash with ion water for 3 to 4 times, then dry the precipitate in static air at 12...

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Abstract

The present invention relates to preparation process of superfine cerium oxide powder, and belongs to the field of the preparing technology of RE compound. The preparation process of superfine cerium oxide powder includes the following steps: preparing salt solution containing cerium ion, adding surfactant into the solution, contacting the solution with alkali matter to control the pH value of the reaction suspension and produce precipitate; converting the suspension with oxalic acid and controlling the pH value in the reaction end point; filtering, washing and drying the precipitate, scalding at 600-1000 deg.cto obtain the superfine cerium oxide powder of grain size 10 nm to 3 micron and specific surface area smaller than 50 sq m / g. The superfine cerium oxide powder is used as polishing material, especially for optical mask.

Description

1. Technical field [0001] The invention relates to a preparation method of ultrafine cerium oxide for polishing, and belongs to the technical field of preparation of rare earth compounds. 2. Background technology [0002] Polishing powders are widely used in industrial fields. The use of rare earth polishing powder can be traced back to World War I. The United States and Canada took the lead in using rare earth polishing powder with cerium oxide as the main component for the grinding of precision military instrument lenses, replacing iron oxide polishing powder. Cerium oxide polishing powder has the advantages of high polishing speed, less operation pollution and high polishing quality. It is precisely because of the development of rare earth polishing powder that the precision of glass grinding surface has been greatly improved, so that rare earth polishing powder is widely used in the world. Now the application of cerium oxide in polishing powder has accounted for nearly...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09C1/68C09C3/06
Inventor 李梅柳召刚胡艳宏郭瑞华张永强史振学
Owner INNER MONGOLIA UNIV OF SCI & TECH
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