Liquid photoresist remover composition, process for producing pattern with the same, and display employing the same

Abstract

A liquid photoresist remover composition which is applicable to substrates comprising silver and / or a silver alloy. The liquid photoresist remover composition comprises: a compound represented by the formula (I): wherein A and B each independently is linear or branched C1-5 alkylene; Y is NH or oxygen; and Z is NH2, OH, or NH-D-NH2 (wherein D is linear or branched C1-5 alkylene); a compound represented by the formula (II): NH2-A-N(-B-OH)2 wherein A and B are the same as in the formula (I); a compound represented by the formula (III): wherein R is hydrogen, C1-5 alkyl, C1-5 hydroxyalkyl, or C1-5 aminoalkyl; one or more members selected from the group consisting of pyrocatechol, hydroquinone, pyrogallol, gallic acid, and gallic esters; and one or more polar organic solvents.

Description

technical field The present invention relates to a photoresist stripper composition for a substrate containing silver and / or a silver alloy, a method for producing a pattern using the composition, and a display device containing the composition. Background technique Organic EL displays are self-luminous, and compared with liquid crystal displays, they are expected to be next-generation flat panel displays that can achieve lower power consumption, higher brightness, and higher contrast. As an organic light-emitting element, for example, a first electrode, an organic layer including a light-emitting layer, and a second electrode are sequentially stacked on a substrate via a TFT (Thin Film Transistor) and a planarization layer. The light emitted from the light emitting layer may be emitted from the substrate side or may be emitted from the second electrode side. Aluminum and aluminum alloys have been used as wiring materials for semiconductor substrates, and for flat panels,...

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Problems solved by technology

However, these documents do not disclose at all the wet etching, the dry etching in which the resist deteriorates and is difficult to peel off, and the resist stripping solution used in the pattern formation of the silver film. Etch stripping solution, there is only a photoresist stripping solution that is not corrosive to current aluminum and aluminum alloys, but it has not been developed so far to be applicable to the patterning of silver and / or silver alloys and to silver and / or Photoresist stripper for silver alloys without corrosion

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