TFT LCD array substrate structure and its producing method

Abstract

This invention discloses a TFT LCD array base plate structure including: a base plate, a grid scanning line and a grid, a grid insulation layer, an active layer, a data scanning line, a source and a drain, light strips and a public electrode, passivation layers formed on the data scanning line, the source and the drain, the light strips and the public electrode, through holes formed on the drain, the light strips and the public electrode, a pixel electrode, a vertical connecting line formed on the passivation layers connecting the light strips vertically by the through hole, a lateral connecting line formed on the passivation layer connecting the public electrodes laterally via the through hole on the public electrode. This invention also discloses a manufacturing method for said TFT LCD array base plate structure.

Description

technical field [0001] The invention relates to a thin film transistor liquid crystal display (TFT LCD), in particular to a thin film transistor liquid crystal display (TFT LCD) array substrate structure and a manufacturing method thereof. Background technique [0002] TFT LCD occupies a dominant position in the current flat panel display market due to its small size, low power consumption, and no radiation. TFT LCD devices are formed by combining array glass substrates and color filter glass substrates. [0003] 1 to 2E are top views and cross-sectional views of various parts of a thin film transistor liquid crystal display array substrate in the prior art. As shown in the figure, the array substrate in the prior art mainly includes: a substrate, a gate scanning line 1 and a gate electrode 2 formed on the substrate; a gate electrode insulating layer 4 and an active layer 3 formed on the gate electrode; The signal scanning line 5, the source electrode 6 and the drain elect...

AI Technical Summary

Problems solved by technology

[0011] Fig. 4 is a schematic diagram of the structure of the common electrode of the gate metal layer in the prior art. As long as one defect occurs on the common electrode line of the gate metal layer of this structure, the common voltage on the common electrode cannot be applied, resulting in the failure of the entire line. The failure of the common electrode wire leads to poor bright lines, and it is difficult to repair

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