A vacuum electron beam welding method

A technology of vacuum electron beam and welding method, which is applied in electron beam welding equipment, welding equipment, furnace type, etc., can solve the problems of reducing porosity, increasing the preservation time of weld pool, and increasing the porosity. Effect

Active Publication Date: 2007-05-16
KONFOONG MATERIALS INTERNATIONAL CO LTD
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Problems solved by technology

[0004] For welding between high-purity aluminum and between high-purity aluminum and aluminum alloys, there is another problem: it is extremely difficult to control the porosity in the weld, because various methods are often used in the smelting stage to prevent the absorbed hydrogen from forming Pores exist in the material in the form of H atoms. When welding aluminum or aluminum alloys, the high temperature of the weld gives the H atoms enough energy to diffuse together to form pores. At the same time, due to the increase in the temperature of the weld, the solubility of hydrogen is sharp Rising, H atoms in the heat-affected zone around the weld will also diffuse into the weld, and hydrogen decomposed from external water, organic matter, etc. will also be absorbed by the weld, so when welding high-purity aluminum or aluminum alloy with electron beam Porosity in the weld is extremely difficult to control
Among them, repeated electron

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  • A vacuum electron beam welding method

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Embodiment 1

[0025] The material is Al-1%Si-0.5%Cu aluminum target, the design weld depth is 20mm, and the porosity is less than 1%. The welding implementation process is as follows:

[0026] (1) Preparation before welding: clean the target and the back plate, remove oxides and impurities on the welding surface of the target and the back plate, and then move the target assembly composed of the fixed target and the back plate to the electron beam vacuum chamber for welding. Isolation and vacuum pumping, electron gun vacuum degree is 6.67×10 -3 Pa, the vacuum degree of the welding chamber is 8×10 -2 Pa;

[0027] (2) Preheating weld seam: use 137.8Kv voltage, 23.5mA current, and 0.5m / min welding speed to preheat one lap;

[0028] (3) Implement the first vacuum electron beam welding: use a voltage of 137.8Kv, a current of 31.6mA, and a welding speed of 0.5m / min to weld one circle;

[0029] (4) Carry out vacuum insulation on the target assembly that has completed step (3): Insulate the targe...

Embodiment 2

[0036] The material is Al-1% Si aluminum target, the design weld penetration depth is 14mm, and the porosity is less than 1%. The welding implementation process is as follows:

[0037] (1) Preparation before welding: clean the target and the back plate, remove oxides and impurities on the welding surface of the target and the back plate, and then move the target assembly composed of the fixed target and the back plate to the electron beam vacuum chamber for welding. Isolation and vacuum pumping, electron gun vacuum degree is 6.67×10 -3 Pa, the vacuum degree of the welding chamber is 8×10 -2 Pa;

[0038] (2) Preheating the weld seam: use a voltage of 137.8Kv, a current of 14.4mA, and a welding speed of 0.5m / min to preheat one lap;

[0039] (3) Implement the first vacuum electron beam welding: use a voltage of 137.8Kv, a current of 22.3mA, and a welding speed of 0.5m / min to weld one circle;

[0040] (4) Carry out vacuum insulation on the target assembly that has completed ste...

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Abstract

The invention relates to a vacuum electronic beam welding method, which comprises (1), welding preparation that cleaning target material and back plate, and moving it into vacuum room to vacuum; (2), preheating welding seam; (3), the first vacuum electronic beam welding; (4), vacuum insulating temperature of target material; (5), second vacuum electronic beam welding; (6), quenching that taking out the target material from the vacuum room, and quenching. Compared with present technique, the invention insulates temperature after the first welding, to accumulate the H atoms on the welding seam to form air holes, then execute the second welding to remove said air holes, and it quenches the target material to avoid dispersing left H atoms, to effectively control the hole rate of welding seam.

Description

technical field [0001] The invention relates to the welding field, in particular to a vacuum electron beam welding method. Background technique [0002] In the field of semiconductor industry, for the manufacturing process of sputtering target products, it is usually necessary to weld high-purity aluminum or aluminum alloy targets that meet the properties of sputtering targets and high-strength aluminum rings, and then undergo rough machining and finishing. And other processes, and finally processed into sputtering target products with qualified dimensions. [0003] For sputtering targets, the surface temperature of the target after welding should not be higher than its recrystallization temperature, otherwise it will lead to changes in the size and orientation of the grains inside the target, and the thermal conductivity of aluminum alloy is particularly large, and the heat transfer is rapid. Only by using a very energy-intensive heat source can it be possible to ensure th...

Claims

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Application Information

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IPC IPC(8): B23K15/06B23K15/02C21D9/50
Inventor 姚力军潘杰
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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