Gemini surfactant and preparing method thereof

A technology of surfactants and gemini surfaces, applied in chemical instruments and methods, dissolution, chemical/physical processes, etc., can solve problems such as reducing the surface activity of surfactants, loose arrangement, and limiting the scope of use
CN1978041AInactive Publication Date: 2007-06-13BEIHANG UNIV
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BEIHANG UNIV
Publication Date
2007-06-13
Estimated Expiration
Not applicable · inactive patent

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Abstract

The present invention relates to a dimeric surfactant (GAP) and its preparation method. Said surfactant is obtained by using ammonium p-nonylphenoxy-2-hydroxypropyltrimethyl chloride (NPQT) as monomer and coupling dimeric NPQT. The measurement of critical micelle concentration (CMC) shows that the CMC value of GAP is two magnitude orders lower than NPQT, so that its surface activity is obviously raised.
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Description

technical field

[0001] The invention belongs to the technical field of surfactants. It specifically relates to the research on the design and preparation method of gemini surfactants. Background technique

[0002] Gemini (Gemini) surfactant means that the molecule contains at least two hydrophilic groups and two hydrophobic groups, and at or near the hydrophilic groups, the linking group (spacer or isolation group) is bound by a chemical bond. A compound formed by bonding two amphiphiles. In the Gemini surfactant molecule, two (or more) hydrophilic groups are connected through chemical bonds by means of linking groups, so that the two surfactant structural units are closely combined. On the one hand, this structure increases the hydrophobic effect of the hydrocarbon chain, which increases the tendency of the hydrophobic group to escape from the aqueous solution; The interface is more tightly arranged, thereby increasing the surface activity of the surfactant. Compared wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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