Novel UMOS-like gate-controlled thyristor structure for ESD protection

Abstract

Described is a MOS gate-controlled SCR (UGSCR) structure with a U-shaped gate (UMOS) for an ESD protection circuit in an IC device which is compatible with shallow trench isolation (STI) and self-aligned suicide (salicide) fabrication technology. The UMOS gate is located in a p-substrate and is surrounded by an n-well on either side. Adjacent to one side of the UMOS gate, a first n+ diffusion is formed which straddles the first n-well. The n+ diffusion together with a p+ pickup diffused next to it form the cathode of the SCR (thyristor). Adjacent to the other side of the UMOS gate, a second n+ and p+ diffusion are formed in a second n-well. The second n+ and p+ diffusion together with the UMOS gate form the anode of the SCR and the input terminal of the circuit to be protected. The SCR is formed by the first n+ diffusion/n-well (cathode), the p-substrate, the second n-well and the second p+ /n+diffusion (anode). A latchup immune circuit is achieved by creating a U-shaped gate structure which is lined with a thick gate oxide--similar to a field oxide--under the poly gate.

Description

BACKGROUND OF THE INVENTION[0001] 1. Field of the Invention[0002] The invention relates to electrostatic discharge (ESD) structures for sub-micron devices, and more particularly to a thyristor (silicon controlled rectifier) which is gated by a U-type gate structure of a MOS (UMOS) transistor.[0003] 2. Description of the Related Art[0004] The Silicon Controlled Rectifier (SCR) is the most efficient of all protection devices in terms of ESD performance per unit area. Usually, the SCR trigger level is quite high. The Low Voltage Trigger SCR (LVTSCR) is the most promising device for ESD protection by surface channel to reduce the drain-tap junction avalanche breakdown. Recently, reports have shown that LVTSCR's with shallow trench isolation (STI), especially on epi, are not functional because the hole current cannot efficiently forward bias the n+ cathode / p-substrate junction. Also, the silicidation process for reducing electrostatic discharge (ESD) performance is still a concern and ne...

AI Technical Summary

Benefits of technology

0008] It is an object of the present invention is to provide a MOS gate-controlled SCR (UGSCR) structure for an ESD protection circuit in an IC device that is compatible with shallow trench isolation (STI) and self-aligned silicide (salicide) fabrication technology without adding any process complexity and cost.

Problems solved by technology

Recently, reports have shown that LVTSCR's with shallow trench isolation (STI), especially on epi, are not functional because the hole current cannot efficiently forward bias the n+ cathode / p-substrate junction.

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