Copper foil with low profile bond enhancement
a copper foil and low-profile technology, applied in the field of composite materials, can solve the problems of increasing manufacturing costs, affecting the integrity of circuit traces, and requiring etching for a longer time, so as to facilitate printing, reduce etching undercutting, and reduce surface roughness
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example 1
[0093] A 2 oz. wrought copper foil was used as a carrier strip. The strip was electrocleaned in an alkaline commercial cleaner using 20 ASF current density for 40 sec. The foil was rinsed and then the release layer treatment was conducted in 20-35 g / l NaOH+0.5-5 g / l chromium ions as sodium dichromate solution using an anodic current of 1-5 ASF followed by a cathodic current of 1-20 ASF for 5-20 sec. The anodic treatment appeared to generate a uniform micro-roughness on the surface of the foil and induce a uniform copper deposit. The cathodic treatment appeared to deposit a transparent layer of chromium and chromium oxides, which is believed to be responsible for the release of the carrier strip after lamination.
[0094] A seed layer of 0.1-0.5 micron copper was electroplated in an alkaline copper plating solution. A 5 micron copper deposit was then electroplated, using 60-70 g / l copper ions as copper sulfate and 60-75 g / l sulfuric acid at 40-100 ASF for 5.4-2.1 minutes, followed by a...
example 2
[0095] A 2 oz. wrought copper foil was used as a carrier strip. The strip was electrocleaned in an alkaline commercial cleaner using 20 ASF current density for 40 sec. The foil was rinsed and then the release layer treatment applied by electroplating in a solution of 20-35 g / l NaOH+0.5-5 g / l chromium ions as sodium dichromate. This treatment appeared to form a transparent layer of chromium and chromium oxides.
[0096] A seed layer of 0.1-0.5 micron copper was electroplated in an alkaline copper plating solution. A 5 micron copper deposit was then electroplated using 60-70 g / l copper ions as copper sulfate and 60-75 g / l sulfuric acid at 40-100 ASF for 5.4-2.1 minutes, followed by a dendritic copper or copper / nickel treatment. After lamination to an FR-4 epoxy substrate, the 2 oz. carrier was easily peeled with a measured bond strength of 0.1-1.0 lb / in.
example 3
[0097] After cleaning the copper carrier strip, a nickel layer was first electroplated with 0.15 micron nickel in a nickel sulfamate bath at 30 ASF for 20 sec. The foil was then immersed in a solution containing 0.2-10.0 g / l chromic acid and 0.5-40 g / l phosphoric acid for 10-40 sec at ambient temperature. The alkaline copper seed layer and acidic copper plating were conducted as described in Example 1. A peelable foil resulted after lamination with 0.2-2.0 lb / in release force.
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