Device and method for lithography

a technology of lithography and substrate, applied in the field of lithography devices and methods, can solve the problems of inability to handle large area substrate surfaces in a single imprint step, difficult imprint process for larger surface area, limited photolithography, etc., to achieve cost-effective, flexible, and improve the effect of structure fabrication

US20050274693A1Inactive Publication Date: 2005-12-15OBDUCAT AB SE
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
Publication Date
2005-12-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).
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Description

FIELD OF THE INVENTION

[0001] The invention relates to a device in connection with the lithography of structures on a micro or nanometre scale. In particular, the invention relates to imprint lithography on substrates or objects. BACKGROUND

[0002] The trend in microelectronics, as well as in micromechanics, is towards ever smaller dimensions. Some of the most interesting techniques for fabrication of micro and submicro structures include different types of lithography.

[0003] Photolithography typically involves the steps of coating a substrate with a photoresist material to form a resist layer on a surface of the substrate. The resist layer is then exposed to radiation at selective portions, preferably by using a mask. Subsequent developing steps remove portions of the resist, thereby forming a pattern in the resist corresponding to the mask. The removal of resist portions exposes the substrate surface, which may be processed by e.g. etching, doping, or metallisation. For fine scale...

Examples

Embodiment Construction

[0072] The present invention relates, in general, to a method of transferring a pattern from a template to a substrate, by creating a relief image of a structure on a surface of the template on a surface of the substrate. The surface of the template and the surface of the substrate are in this process arranged generally parallel to each other, and the transfer of the pattern is obtained by pressing the structured template surface into a formable layer disposed on the substrate surface. The formable layer is treated to solidify, such that its shape is forced to resemble the template surface. The template can thereafter be removed from the substrate and its layer, said layer now being an inverted topographical replica of the template. In order to permanent the transferred pattern in the substrate, further processing may be required. Typically, wet or dry etching is performed to selectively etch the surface of the substrate under the solidified layer, whereby the pattern in the solidif...