Projection Optical Device And Exposure Apparatus

Inactive Publication Date: 2008-03-20
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0034] An exposure apparatus can be provided with a projection optical device according to various aspects of this invention. Such an exposure apparatus transfers and exposes an image of the pattern onto a substrate by the projection optical system. In this exposure apparatus, when the projection optical device according to the first aspect of this invention is provided, in a portion in which the projection optical system or the like is needed, high rigidity can be obtained, and the device performance capability of the vibration isolation performance capability or the like can be kept high, and the entire mechanism portion can be lightened by suspending and supporting the projection optical system.
[0035] Furthermore, by supporting the projection optical s

Problems solved by technology

In exposure apparatus, rigidity of: (i) the stages which move and position a reticle and a wafer, (ii) a support mechanism of the stages, and (iii) a mechanism portion of the support mechanism and the like of a projection optical system, significantly affects the performance capability of the apparatus, such as a vibration control performance capability, an exposure accuracy (overlay accuracy or the like), weight of the mechanism portion, and manufacturing cost of the exposure apparatus.
In general, an exposure apparatus having a mechanism portion with high rigidity, while providing a high apparatus performance capability, tends to have a heavy mechanism portion, and a higher manufacturing cost.
For example, in a mechanism portion, when members with high rigidity are coupled to each other through members having high rigidity, vibration can be easily transmitted, a bi-metal effect is generated at the time of temperature change (if different materials are used for the members), and the temperature characteristics may be deteriorated.
However, as a result of increasing rigidity of the mechanism portion, when the weight of the mechanism portion increases, there also is

Method used

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Examples

Experimental program
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Example

Second Embodiment

[0102] The following explains a second exemplary embodiment of this invention with reference to FIGS. 7 and 8. With respect to the projection exposure apparatus of this example, a mechanism which stabilizes the temperature of the projection optical system PL is added to the projection exposure apparatus of FIG. 2. In FIGS. 7 and 8, the same symbols are used for the portions corresponding to the portions of FIG. 2, and their detailed description is omitted. Furthermore, in FIG. 7, in order to clarify understanding of the additional structure, the air duct 16 and the small air conditioning device 17 of FIG. 2 are omitted.

[0103]FIG. 7 shows a schematic structure of a mechanism portion of the projection exposure apparatus of this example. In FIG. 7, a recovery tank 45 which collects a cooling liquid is provided on the floor, a supply tank 48 which stores the liquid is provided in the vicinity of one vertex of the triangle frame-shaped upper column 34, and a support me...

Example

Third Embodiment

[0107] The following explains a third embodiment of this invention with reference to FIG. 9. In this example, in the same manner as in the embodiment of FIG. 2, this invention is applied to a step and repeat exposure type projection exposure apparatus. In FIG. 9, the same symbols are used for the portions corresponding to the portions of FIG. 2, and their detailed description is omitted.

[0108]FIG. 9 shows a schematic structure of a mechanism portion of the projection exposure apparatus of this example. In FIG. 9, three columns 33A, 33B (the third column, 33C, is undepicted) are fixed to the floor F (which also could be a supporting frame located on a floor), and extend parallel to the Z axis. The upper column 34B is supported on the columns 33A, 33B, 33C via passive-type vibration isolation members 51A, 511B (and undepicted 51C), which include, for example, an air damper and / or a coil spring. Furthermore, the flange 18 (support member) is integral with the projecti...

Example

[0112] Other parts of the structure are the same as in the first embodiment of FIG. 2. In this example as well, the reticle stage RST which micro-moves the reticle R is integrally fixed to the projection optical system PL, and the measurement mount 15 is supported by a kinematic support method via the three rods 38A-38C from the bottom surface of the flange 18. The laser interferometer system 12, or the like, is fixed to the measurement mount 15. Furthermore, the image of the whole reticle R pattern is transferred to the respective shot areas on the wafer W via the projection optical system PL.

[0113] According to this example, the projection optical system PL is suspended and supported by the upper column 34B. Therefore, in the same manner as in the first embodiment, a vibration isolation performance capability can be improved, and the mechanism portion can be lightened. Furthermore, the rods 52A-52C are used as coupling members, so even when the projection optical system PL is hea...

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PUM

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Abstract

A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a positioning device having an actuator to position the projection optical system. The projection optical device can include a frame to which one end of the flexible structure is attached. The projection optical system may hang from the frame via the support device, or it may be supported from below by the support device. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

Description

[0001] This application claims the benefit of U.S. Provisional Application No. 60 / 614,426, filed Sep. 30, 2004. The disclosure of U.S. Provisional Application No. 60 / 614,426 is incorporated herein by reference in its entirety.BACKGROUND OF THE INVENTION [0002] 1. Field of Invention [0003] This invention relates to a projection optical device provided with a projection optical system which projects an image of a predetermined pattern, and to an exposure apparatus which is used in order to transfer a pattern of a mask onto a substrate in order to manufacture various devices such as, for example, a semiconductor device, a liquid crystal display, etc. [0004] 2. Description of Related Art [0005] In a lithography process, which is one process used to manufacture a semiconductor device, an exposure apparatus is used in order to transfer and expose a pattern formed on a reticle (or a photomask, etc.) onto a wafer (or a glass plate, etc.) coated by photoresist as a substrate. Various types o...

Claims

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Application Information

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IPC IPC(8): G03B27/42G03B27/54
CPCG03F7/70808G03F7/709G03F7/70891G03F7/70833H01L21/6715
Inventor EBIHARA, AKIMITSULEE, MARTIN E.YUAN, BAUSAN
Owner NIKON CORP
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