Photovoltaic Cell and Production Thereof
a photovoltaic cell and photovoltaic technology, applied in the field of photovoltaic devices, can solve the problems of limited use of photovoltaic cells, wafer damage, and additional time, materials and handling, etc., and achieve the effect of simplifying the production of highly efficient photovoltaic cells
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[0041]Photovoltaic cells were made according to the process of this invention using monocrystalline boron-doped pseudo-square silicon substrates having a diameter of 150 mm and straight side width of 125 mm. The substrate thickness was 300 micrometers. The p-n junction was created by phosphorous diffusion after texturing of the substrate. The substrate was coated with silicon nitride in accordance with the process of this invention such that the thickness of the silicon nitride coating on the front surface was about 74 to 75 nanometers. Texture and phosphorous doping were removed from substantially all of the back surface by back surface etching in a 30 wt % aqueous NaOH bath for about 90 seconds at a temperature in the range of 81 to 91° C. Front and back contacts were applied by screen printing method using a silver paste. Aluminum was then screen printed onto the portion of the back surface free of silver and free of silicon nitride. The cells were then fired at a temperature of ...
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