Lithographic machine platform and applications thereof

Abstract

A lithographic machine platform and applications thereof is disclosed. The lithographic machine platform comprises: an electron beam or an ion beam generator generating an electron beam or an ion beam; a substrate supporting platform supporting a substrate; and a precursory gas injector injecting a precursory gas above the substrate. The present invention uses the electron beam or the ion beam to induce the precursory gas to react with the electron beam or the ion beam, and then the precursory gas is deposited on the substrate. The present invention not only fabricates a patterned layer on the substrate in a single step but also achieves a high lithographic resolution and avoids remains of contaminations by using the properties of the electron beam or the ion beam and the precursory gas.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a lithographic technology, particularly to an electron beam or ion beam lithographic machine platform and applications thereof, which is applied to the lithographic technology.[0003]2. Description of the Related Art[0004]Presently, in a advanced lithographic fabrication process, patterns are generated by using an optical method, an electron beam, a nano impression method on a specific polymer coating layer (namely, the polymer material that is sensitive to lights or electron beams), also called resist, through chemical reactions or variations of thermal current stress and then used as a required mask when the subsequent pattern is transferred. But the resist usually requires complicated thermal treatment, exposure and development or the hull release fabrication process. Besides, for the lithography technology with a high resolution, a thickness of the resist is not enough for consumption...

AI Technical Summary

Benefits of technology

[0008]Further objective of the present invention is to provide a lithographic machine platform and application thereof, wherein not only number of the steps of the lithographic fabrication process and the fabrication cost can be reduced but abnormal fabrication processes and production defects caused by the minute and complicated fabrication process steps can be reduced, and then the production yield is increased.

Problems solved by technology

On the contrary, the existing advanced immersion lithography is moistened and stuck by an immersion liquid to create residual and contaminations.

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