Resist composition and method for producing resist pattern

a composition and resist technology, applied in the direction of photosensitive materials, instruments, photomechanical equipment, etc., can solve the problems of increasing the number of resist pattern defects to be produced from resist compositions, and achieve excellent resist composition, good resist composition quality, and good resist composition quality.

Active Publication Date: 2012-03-01
SUMITOMO CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

0060]According to a resist composition of the present invention, it is possible to produce a resist pattern with excellent DOF (wide DOF) and with excellent MEF at producing the resist pattern, and with few defects in the pattern.

Problems solved by technology

However, with the conventional resist composition, the focus margin (DOE) at producing a resist pattern may be not always satisfied with, the mask error factor (MEF) of the obtained resist pattern may be not always satisfied with, and number of the defect of the resist pattern to be produced from the resist composition may quite increase.

Method used

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  • Resist composition and method for producing resist pattern
  • Resist composition and method for producing resist pattern
  • Resist composition and method for producing resist pattern

Examples

Experimental program
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Effect test

synthesis example 1

Synthesis of Compound (I)

[0618]

[0619]10.00 parts of a compound (I-2), 40.00 parts of tetrahydrofuran and 7.29 parts of pyridine were introduced into a reactor, and stirred for 30 minutes at 23° C. The obtained mixture was cooled to 0° C. To this mixture, 33.08 parts of a compound (I-1) was added over 1 hour while maintaining at the same temperature. The temperature of the mixture was then elevated to about 23° C., and the mixture was stirred for 3 hours at the same temperature. 361.51 parts of ethyl acetate and 20.19 parts of 5% hydrochloric acid solution were added to the obtained reactant, and stirred for 30 minutes at 23° C. Then, after allowed to stand, the obtained solution was separated to recover an organic layer. To the organic layer, 81.42 parts of a saturated sodium hydrogen carbonate was added, and the obtained solution was stirred for 30 minutes at 23° C., allowed to stand, and then separated to recover the organic layer. To the recovered organic layer, 90.38 parts of io...

synthesis example 2

Synthesis of Compound (J)

[0621]

[0622]8.50 parts of a compound (J-2), 34.00 parts of tetrahydrofuran and 6.20 parts of pyridine were introduced into a reactor, and stirred for 30 minutes at 23° C. The obtained mixture was cooled to 0° C. To this mixture, 13.78 parts of a compound (J-1) was added over 1 hour while maintaining at the same temperature. The temperature of the mixture was then elevated to about 23° C., and the mixture was stirred for 3 hours at the same temperature. 249.91 parts of ethyl acetate and 17.16 parts of 5% hydrochloric acid were added to the obtained reactant, and stirred for 30 minutes at 23° C. Then, after allowed to stand, the obtained solution was separated to recover an organic layer. To the recovered organic layer, 62.62 parts of a saturated sodium hydrogen carbonate was added, and the obtained solution was stirred for 30 minutes at 23° C., allowed to stand, and then separated to recover the organic layer. To the recovered organic layer, 62.62 parts of io...

synthesis example 3

Synthesis of Compound (O)

[0625]

[0626]88.00 parts of a compound (0-2), 616.00 parts of methyl isobutyl ketone and 60.98 parts of pyridine were mixed while stirring for 30 minutes at 23° C. The obtained mixture was cooled to 0° C. To this mixture, 199.17 parts of a compound (O-1) was added over 1 hour while maintaining at the same temperature. The temperature of the mixture was then elevated to about 10° C., and the mixture was stirred for 1 hour at the same temperature. Thus obtained reactant was added to 1446.22 parts of n-heptane and 703.41 parts of 2% of hydrochloric acid solution to obtain a mixture, the mixture was stirred for 30 minutes at 23° C. The obtained solution was allowed to stand, and then separated to recover an organic layer. To the organic layer, 337.64 parts of 2% of hydrochloric acid solution was added, and the obtained solution was stirred for 30 minutes at 23° C., allowed to stand, and then separated to recover the organic layer. To the recovered organic layer, ...

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Abstract

A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator.
    • wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1);
    • wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application claims priority to Japanese Applications No. 2010-191868 filed on Aug. 30, 2010, No. 2010-260921 filed on Nov. 24, 2010, No. 2011-39451 filed on Feb. 25, 2011 and No. 2011-107973 filed on May 13, 2011. The entire disclosures of Japanese Applications No. 2010-191868, No. 2010-260921, No. 2011-39451 and No. 2011-107973 are incorporated hereinto by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to a resist composition and a method for producing a resist pattern.[0004]2. Background Information[0005]Various kinds of photolithographic technique in which short wavelength light such as ArF excimer laser (193 nm of wavelength) is a exposure light source have been actively studied in the past as the semiconductor microfabrication. A resist composition used for such photolithographic technique contains a polymer polymerized a compound represented by the formula (A), a compound...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03F7/20G03F7/004
CPCG03F7/0045G03F7/0046G03F7/0397G03F7/2041G03F7/00G03F7/004G03F7/0382G03F7/0392G03F7/30Y10S430/111Y10S430/126G03F7/38
Inventor MASUYAMA, TATSUROYAMAMOTO, SATOSHIICHIKAWA, KOJI
Owner SUMITOMO CHEM CO LTD
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