Copper Plating Solutions and Method of Making and Using Such Solutions
a technology of copper plating solution and solution, applied in the direction of basic electric elements, electrical equipment, semiconductor devices, etc., can solve the problems of high cost of silver paste, inability to meet the requirements of use,
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example 1
[0037]In one non-limiting embodiment, a solar cell with an efficiency of 18% is electroplated in a solution containing 80 g / L copper sulfate pentahydrate, 100 g / L lithium sulfate, pH adhusted to 2.3 with sulfuric acid or sodium hydroxide. A silver paste containing solar cell with an aluminum containing backside is electroplated at 50 ASF for 2 minutes. A matte copper deposit is obtained on the silver paste seed layer. The efficiency of the solar cell after plating increased to 19%, the aluminum backing of the solar cell remained unaffected by the plating solution. The silver paste seed layer adhesion to the silicon wafer was not compromised.
example 2
[0038]In one non-limiting embodiment, a solar cell with an efficiency of 18% is electroplated in a solution containing 80 g / L copper sulfate pentahydrate, 100 g / L lithium sulfate, 0.2 g / L of a thio-imidazole compound, the pH is adjusted to 2.3 with sulfuric acid or sodium hydroxide. A silver paste containing solar cell with aluminum back is light induced plated at 50 ASF for 2 minutes. A bright copper deposit is obtained on the silver paste seed layer. The efficiency of the solar cell after plating increased to 19.2%, the aluminum backing of the solar cell remained unaffected by the plating solution. The silver paste seed layer adhesion to the silicon wafer was not compromised.
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