Polyimide dry film and application thereof
a technology of polyimide and dry film, applied in the field of polyimide dry film, can solve the problems of low process yield, high cost, failure to meet the requirements of high precision assembly, etc., and achieve the effects of simple application process, good heat resistance, dimensional stability, insulativity and chemical resistan
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preparation example 1
sitive Polyimide Precursor Resin PAA-1
[0149]21.81 g (0.1 mol) pyromellitic dianhydride (referred to hereinafter as PMDA) was dissolved in 200 g N-methyl-2-pyrrolidone (referred to hereinafter as NMP). The mixture obtained was then heated to 50° C. and agitated for reaction over 2 hours. 1.161 g (0.01 mol) 2-hydroxyethyl acrylate (referred to hereinafter as HEA) was slowly added dropwise and then the mixture was agitated for reaction over 2 hours at a fixed temperature of 50° C. Then, 20.024 g (0.1 mol) 4,4′-oxydianiline (referred to hereinafter as ODA) was added to the solution, and after complete dissolution, it was farther agitated for reaction over 6 hours at a fixed temperature of 50° C. to form a photosensitive polyimide precursor resin PAA-1, in which the solid content was about 17 wt % (the solid content was obtained by baking the resin at 250° C. or 300° C. for 1 hour to remove all the solvent, and measuring the weight difference of the resin before and after baking to obtai...
preparation example 2
sitive Polyimide Precursor Resin PAA-2
[0150]21.81 g (0.1 mol) PMDA was dissolved in 200 g N-ethyl-2-pyrrolidone (referred to hereinafter as NEP). The mixture obtained was then heated to 50° C. and agitated for reaction over 2 hrs. 1.161 g (0.01 mol) HEA was slowly added dropwise and then the mixture was agitated for reaction over 2 hours at a fixed temperature of 50° C. Then, 20.024 g (0.1 mol) ODA was added to the solution, and after complete dissolution, it was further agitated for reaction over 6 hours at a fixed temperature of 50° C. to form a photosensitive polyimide precursor resin PAA-2, in winch the solid content was about 17 wt % (the solid content was obtained by baking the resin at 250° C. or 300° C. for 1 hour, and measuring the weight difference of the resin before and after baking to obtain the weight of non-volatile materials, and calculate the weight percentage of the non-volatile material in PAA-2).
preparation example 3
sitive Polyimide Precursor Resin PAA-3
[0151]21.81 g (0.1 mol) PMDA was dissolved in 200 g NMP. The mixture obtained was then heated to 50° C. and agitated for reaction over 2 hrs. 13.01 g (0.01 mol) 2-hydroxyethyl methacrylate (referred to hereinafter as HEMA) was slowly added dropwise and then the mixture was agitated for reaction over 2 hours at a fixed temperature of 50° C. Then, 20.024 g (0.1 mol) ODA was added to the solution, and after complete dissolution, it was further agitated for reaction over 6 hours at a fixed temperature of 50° C. to form a photosensitive polyimide precursor resin PAA-3, in which the solid content was about 21 wt %.
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