The invention relates to a preparation method of a
copper-doped DLC (
diamond-like carbon) film based on magnetron
sputtering, and belongs to the technical field of preparation of
diamond-like carbon films. By designing a special splicing target with a
copper-carbon ratio of 1: 3, and combining accurate adjustment of a sample relative to a target material placing position before
film coating and gradient control of
acetylene introduction flow in a DLC film
preparation stage, the
copper-doped DLC film is prepared; a multi-dimensional synergistic
copper doping content regulation and control mechanism is formed, the
copper doping content can be flexibly, accurately and repeatedly adjusted within the range of 2.5 at%-9.1 at%, the problem of target poisoning easily caused by introduction of precursor gas such as
acetylene when
metal-doped DLC is prepared through a traditional magnetron
sputtering technology is effectively solved, and the
metal-doped DLC prepared through the magnetron
sputtering technology is high in yield and good in stability. Meanwhile, the technical defects that in the process of preparing the DLC through pure carbon target sputtering, the
hydrogen content of the film is too low, and the film cannot adapt to the
nitrogen working condition are overcome, the prepared copper-doped DLC film is a-C: H type, the
hydrogen content meets the
nitrogen environment use requirement, and the copper-doped DLC film can be well applied to the friction
lubrication scene under the
nitrogen working condition.