Direct write-in method and apparatus of parallel laser based on harmonic resonance method

Abstract

This invention relates to laser direct write method and device based on resonance vibration , wherein, the method comprises the following steps: it writes the laser and focus laser projection filter system and resonance infraction lens array in two split lens; separately forming exposure combination point array and focus point array in surface; exposure combination point and load base slice work station for connection control to fulfill random float pattern process; test focus point is reflected by point array base slice through resonance infraction lens array, projection filter system, two direction split lens, lambada / 4 wave, bias split lens then into off focus system to form off focus signals together with computer, focus adjusting system to fulfill focus adjusting servo.

Description

technical field [0001] The invention belongs to the technical field of laser direct writing, and in particular relates to a parallel laser direct writing method and device based on a harmonic resonance method. Background technique [0002] Existing laser direct writing technology adopts single-point exposure mode, and the production efficiency is low. In order to improve the production efficiency of devices such as microarrays and microstructured optics, scholars at home and abroad have made many beneficial attempts. [0003] Patent 200410017768.6 "High-resolution digital micro-optical grayscale mask production system and production method" uses two to three spatial light modulators to modulate the writing laser, and completes the exposure production through the projection of the compact projection objective lens. This invention can improve the system Light intensity modulation resolution, but the system has high requirements for the power of the writing laser, the performa...

AI Technical Summary

Problems solved by technology

However, considering the working characteristics of the single wavelength of the zone plate, the system introduces zone plates suitable for the two wavelength bands of the writing laser and the focusing laser respectively in the same objective lens array, so that the focusing system is separated from the writing system. During production, due to the uniformity of photoresist coating, the axial runout of the shaft system, the tilt of the substrate and the manufacturing error of the micro-objective lens array, it not only increases the difficulty of control, but also affects the synchronization, accuracy and stability of focusing. Currently, only Limited to the production of binary graphics such as masks and integrated circuits; at the same time, the difficulty of producing the objective lens array also increases, and the light utilization rate of the zone plate is low

Images