Direct write-in method and apparatus of parallel laser based on harmonic resonance method

A laser direct, harmonic resonance technology, applied in photoplate process exposure devices, microlithography exposure equipment, electrical components, etc. The problem of low light utilization rate of the zone plate can reduce the difficulty of production, optimize the width and number of annular bands, and reduce the difficulty of control.

A laser direct, harmonic resonance technology, applied in photoplate process exposure devices, microlithography exposure equipment, electrical components, etc. The problem of low light utilization rate of the zone plate can reduce the difficulty of production, optimize the width and number of annular bands, and reduce the difficulty of control.

CN1952789AInactive Publication Date: 2007-04-25严格集团股份有限公司
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  • Direct write-in method and apparatus of parallel laser based on harmonic resonance method
  • Direct write-in method and apparatus of parallel laser based on harmonic resonance method
  • Direct write-in method and apparatus of parallel laser based on harmonic resonance method

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Embodiment Construction

[0025] Embodiments of the parallel laser direct writing method and device based on the harmonic resonance method of the present invention will be described in detail below with reference to the accompanying drawings.

[0026] As shown in Figure 1, the device of the present invention includes: a writing laser 11, an acousto-optic modulator 12, a collimating beam expander system 13, a mirror 14, a spatial light modulator 15, a dichroic mirror 121, and a projection filter system 122. Harmonic diffraction objective lens array 123, exposure substrate 124, substrate workbench 125, computer 126, focus detection laser 21, collimator beam expander system 22, polarization beam splitter prism 23, λ / 4 wave plate 24, defocus detection system 25 , a focusing drive system 26 and a number of data lines, wherein the dichroic mirror 121 is arranged at the joint intersection position between the bottom of the spatial light modulator 15 and the side of the λ / 4 wave plate 24; the harmonic diffracti...

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Abstract

This invention relates to laser direct write method and device based on resonance vibration , wherein, the method comprises the following steps: it writes the laser and focus laser projection filter system and resonance infraction lens array in two split lens; separately forming exposure combination point array and focus point array in surface; exposure combination point and load base slice work station for connection control to fulfill random float pattern process; test focus point is reflected by point array base slice through resonance infraction lens array, projection filter system, two direction split lens, lambada / 4 wave, bias split lens then into off focus system to form off focus signals together with computer, focus adjusting system to fulfill focus adjusting servo.

Description

technical field [0001] The invention belongs to the technical field of laser direct writing, and in particular relates to a parallel laser direct writing method and device based on a harmonic resonance method. Background technique [0002] Existing laser direct writing technology adopts single-point exposure mode, and the production efficiency is low. In order to improve the production efficiency of devices such as microarrays and microstructured optics, scholars at home and abroad have made many beneficial attempts. [0003] Patent 200410017768.6 "High-resolution digital micro-optical grayscale mask production system and production method" uses two to three spatial light modulators to modulate the writing laser, and completes the exposure production through the projection of the compact projection objective lens. This invention can improve the system Light intensity modulation resolution, but the system has high requirements for the power of the writing laser, the performa...

Claims

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Application Information

Patent Timeline
25 Apr 2007
Publication
CN1952789A
IPC
G03F7/20; H01L21/027
Inventors
谭久彬; 单明广