Method and apparatus for modifyig polymer high-molecular material surface
A polymer material and surface modification technology, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problem that polymer polymer materials cannot tolerate and improve the anti-ultraviolet radiation, process Simple, operable effects
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Embodiment 1
[0021] 1) take the cleaned polyethylene as the substrate, place it in the reaction chamber of the pulse excited plasma chemical vapor deposition device, and fix it between the upper and lower parallel electrodes;
[0022] 2) Vacuumize the reaction chamber to a background vacuum of 3×10 -3 Pa, enter pure argon and hydrogen, keep the substrate at room temperature, turn on the pulse excitation power supply, the voltage of the power supply is 3kV, generate plasma to bombard the substrate for 20 minutes, and activate the polyethylene surface;
[0023] 3) Feed ethylene gas with a purity of 99.9% again, control the gas flow ratio as argon: hydrogen: ethylene=4:1:0.5, adjust the reaction pressure to 500Pa, adjust the frequency of the pulse excitation power supply to 1.2kHz, and the voltage to 10kV. A diamond-like carbon film was deposited on the substrate at a rate of 50 nm / min.
[0024] The deposited film was analyzed by Raman spectrum, and it had the Raman characteristic peak of di...
Embodiment 2
[0026] 1) take the cleaned polyester as the substrate, place it in the reaction chamber of the pulse excited plasma chemical vapor deposition device, and fix it between the upper and lower parallel electrodes;
[0027] 2) Vacuumize the reaction chamber to a background vacuum of 3×10 -3 Pa, enter pure argon and hydrogen, heat the substrate to 80°C, turn on the pulse excitation power supply, the voltage of the power supply is 3kV, generate plasma to bombard the substrate for 20 minutes, and activate the polyester surface;
[0028] 3) Feed ethylene gas with a purity of 99.9% again, control the gas flow ratio as argon: hydrogen: ethylene=4:0.5:0.1, adjust the reaction pressure to 300Pa, adjust the frequency of the pulse excitation power supply to 2.0kHz, and the voltage to 20kV. A diamond-like carbon film was deposited on the substrate at a rate of 60 nm / min.
[0029] The deposited film was analyzed by Raman spectroscopy, and it had Raman characteristic peaks of diamond-like, whi...
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