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Photoresist composition for multi-micro nozzle head coater

A technology of photoresist and composition, which is applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment, can solve pollution and other problems, and achieve the effect of solving pollution problems and improving uniformity

Inactive Publication Date: 2009-06-17
SAMSUNG DISPLAY CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, if PR is coated with MMN, then various contaminations are formed

Method used

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  • Photoresist composition for multi-micro nozzle head coater
  • Photoresist composition for multi-micro nozzle head coater
  • Photoresist composition for multi-micro nozzle head coater

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] With 5 grams of 2,3,4,4-tetrahydroxybenzophenone-1,2-naphthoquinone diazide-5-sulfonate (sensitizer), 21 grams of phenolic aldehyde made in Preparation Example 1 Varnish resin (polymer resin), 74 g of a 50 / 50 mixture of PGMEA / nBA (organic solvent), and 500 ppm polyoxyalkylene dimethylpolysiloxane copolymer (silicon-based surfactant) were placed in a cooling tube and stirrer in the reactor. The mixture was stirred at room temperature at 40 rpm to prepare a photoresist composition.

[0057] The produced photoresist composition was dropped on a 0.7T (thickness, 0.7 mm) glass substrate. The glass was rotated at a constant speed, and then dried by heating at 115° C. for 90 seconds to form a film with a thickness of 1.50 μm. A patterned mask is placed over the film, and ultraviolet light is shone on the film. The substrate was then soaked in a 2.38% tetramethylammonium hydroxide aqueous solution for 60 seconds to remove the portion exposed to the ultraviolet light and form...

Embodiment 2

[0059] The production process of Example 1 was accomplished using a 50 / 50 mixture of PGMEA / EEP as the organic solvent.

Embodiment 3

[0061] Add 500ppm surfactant to complete the production process of Example 2.

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Abstract

The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits. The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

Description

technical field [0001] The present invention relates to a photoresist composition for use in MMN (Multiple Micro Nozzle) coaters, and more particularly to a photoresist composition with improved uniformity and less contamination problems , this composition is suitable for the MMN coating machine of large glass in the fifth generation line (5th generation line), and helps to improve productivity and product quality. Background technique [0002] As demand for LCD panels increases, especially for TVs and monitors, larger glass and better panels are required. Due to this tendency, it is necessary to develop a new type of photoresist requiring new process conditions. The photolithography process on large glass is an important process that determines the line productivity. The coating performance of the photoresist film, the presence of contamination, contrast, resolution, adhesion to the substrate, material remaining on the film, etc. directly affect the quality of the circuit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/016G03F7/039H01L21/00G03F7/004G03F7/022G03F7/023G03F7/16
CPCG03F7/0048G03F7/0236G03F7/004
Inventor 姜圣哲周振豪李有京李东基金孝烈姜勋李承昱金柄郁
Owner SAMSUNG DISPLAY CO LTD