Chemical method for preparing nano metal iodine compound film

Abstract

A chemical process for preparing the nano-class metallic iodide film features that its substrate may be a metallic one made of Pb, Cu, Ag, or Cd, or a semiconductor material with a plated metallic film, layer, or a glass plate with a plated Ag layer, and the reactant iodine may be the organic solution of ethanol, propanol, n-hexane, propanetriol, etc, or the monomer iodine. The iodine and organic solvent take part in reaction in teflon reactor at 60-160 deg.C for 6-24 hr.

Description

Technical field: [0001] The invention belongs to the technical field of material chemistry, and in particular relates to a chemical method for preparing a nanometer metal iodide thin film. Background technique: [0002] Although there are a large number of international literature reports on the preparation, purification and application prospects of metal iodides (lead iodide, chromium iodide, cuprous iodide, silver iodide, etc.), there are not many new efficient and quick preparation methods. See, there are fewer reports in this area in China. Usually, the crystal of metal iodide can be simply obtained by the wet chemical reaction of iodine salt and metal salt, but since the reaction involves other metal ions or surfactants, it will inevitably bring impurities such as sodium, oxygen, sulfur, etc. in the final product. In recent years, some special preparation methods such as gel method, vapor deposition method, spray pyrolysis, etc. to prepare PbI 2 Crystal technology al...

AI Technical Summary

Problems solved by technology

[0003] The problem to be solved by the present invention is: the current method for preparing metal iodide thin films has problems such as product impurity, complicated process, harsh conditions, easy to cause product decomposition, and potential safety hazards such as explosion.