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Method for preparing Nano structure and thin film of molybdenum trioxide by using infrared sintering furnace

A technology of molybdenum trioxide and nanostructure, which is applied in nanostructure manufacturing, molybdenum oxide/molybdenum hydroxide, nanotechnology, etc., can solve the problems of low yield, complex preparation process, and restricted application, and achieve high yield and preparation The effect of simple process and low cost

Active Publication Date: 2007-12-26
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, MoO was synthesized by electrochemical and solution methods. 3 Nanostructure, the preparation process is complicated, the yield is low, and MoO cannot be prepared on large-area substrates 3 Nanostructured thin films, which restrict their application

Method used

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  • Method for preparing Nano structure and thin film of molybdenum trioxide by using infrared sintering furnace
  • Method for preparing Nano structure and thin film of molybdenum trioxide by using infrared sintering furnace
  • Method for preparing Nano structure and thin film of molybdenum trioxide by using infrared sintering furnace

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Molybdenum trioxide nanorods and thin films prepared on ITO glass

[0036] 1. Use ITO glass as the substrate, and ultrasonically clean it in acetone and absolute ethanol respectively;

[0037] 2. Start the sintering furnace device, so that the temperature of the evaporation source area rises to 650 ° C ~ 850 ° C, and the temperature of the substrate area is 150 ° C ~ 450 ° C, and keep it stable;

[0038] 3. When the temperature reaches the set temperature and starts to stabilize, transport the quartz boat loaded with molybdenum powder and ITO glass to the designated temperature zone;

[0039] 4. Keep warm for more than 1 minute;

[0040] 5. Cut off the heating source, so that the system enters the natural slow cooling process. After cooling to room temperature, take out the quartz boat and ITO glass, it can be observed that off-white substances are generated on the ITO glass substrate.

Embodiment 2

[0042] Preparation of molybdenum trioxide nanorods and thin films on glass

[0043] 1. Select ordinary glass as the substrate, and ultrasonically clean it in acetone and absolute ethanol respectively;

[0044] 2. Start the sintering furnace device, so that the temperature of the evaporation source area rises to 650 ° C ~ 850 ° C, and the temperature of the substrate area is 150 ° C ~ 450 ° C, and keep it stable;

[0045] 3. When the temperature reaches the set temperature and starts to stabilize, transport the quartz boat loaded with molybdenum powder and ordinary glass substrate to the designated temperature zone;

[0046] 4. Keep warm for more than 20 minutes;

[0047] 5. Cut off the heating source, so that the system enters the natural slow cooling process. After cooling to room temperature, take out the quartz boat and the glass substrate, and it can be observed that off-white substances are generated on the glass substrate.

Embodiment 3

[0049] Molybdenum trioxide nanosheets and thin films prepared on ITO glass

[0050] 1. Use ITO glass as the substrate, and ultrasonically clean it in acetone and absolute ethanol respectively;

[0051] 2. Start the sintering furnace device, so that the temperature of the evaporation source area rises to 650 ℃ ~ 950 ℃, and the temperature of the substrate area is from room temperature to 150 ℃, and remains stable;

[0052] 3. When the temperature reaches the set temperature and starts to stabilize, transport the quartz boat loaded with molybdenum powder and ITO glass to the designated temperature zone;

[0053] 4. Keep warm for more than 1 minute;

[0054] 5. Cut off the heating source, so that the system enters the natural slow cooling process. After cooling to room temperature, take out the quartz boat and ITO glass, it can be observed that off-white substances are generated on the ITO glass substrate.

[0055] For the molybdenum trioxide nanostructures and thin films prep...

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Abstract

This invention discloses a method for preparing MoO3 nanostructure and its thin film in IR sintering furnace. The method comprises: heating and evaporating Mo evaporation source in atmospheric environment in an IR sintering furnace, reacting with oxygen in air to form MoO3, and depositing on a substrate to form MoO3 nanostructure and its thin film. The method has such advantages as simple process, high yield and low cost, and is suitable for preparing large-area MoO3 nanostructure and its thin film.

Description

technical field [0001] The invention relates to a method for preparing a molybdenum trioxide nanostructure and a film thereof by using an infrared sintering furnace. Background technique [0002] Molybdenum has a relatively low work function among metals, and has good temperature characteristics, small evaporation rate, and good mechanical properties. It is a classic field electron emission material. Molybdenum oxide is a semiconductor material, such as molybdenum trioxide (MoO 3 ) is an n-type wide bandgap semiconductor material. It has a wide range of applications in electrochromic, solid-state micro-batteries, and memory materials. At the same time, it is also a good catalyst for the synthesis of molybdenum compounds such as MoS 2 , MoSe 2 etc. precursors. In materials with electrochromic properties such as WO 3 , NiO 3 , IrO 2 , V 2 o 5 , MnO 2 、MoO 3 Wait, MoO 3 Yes except WO 3 One of the most studied materials. MoO 3 It has a relatively flat absorption sp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G39/02B82B3/00
Inventor 许宁生班冬梅邓少芝陈军余峻聪
Owner SUN YAT SEN UNIV
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