Low temperature plasma device for treating volatile organic

Abstract

The present invention relates to a low temperature plasma device for disposing volatile organic matter and belongs to the volatile organic exhaust gas disposal field. An air inlet (1) of the device is connected with a reactor crust (10) by a gradually diffusing apparatus (2). A high pressure polar plate (4) is arranged inside the reactor crust (10), and the high pressure polar plate (4) is connected with the reactor crust (10). The high pressure pole nozzles (5) are uniformly distributed on the high pressure polar plate (4) and are used for producing the plasmas. A ground plate (7) is arranged between the high pressure polar plate (4) and the reactor crust (10). A gap is left between the ground plate (7) and the reactor crust (10) for air to pass. The air outlets (12) are arranged at two side faces of the reactor crust (10). The present invention improves the utilization rate of the plasma, and a medium baffle layer avoids occurrence of electric arc. The present invention also has the advantages of simple structure, strong applicability, high disposal efficiency and low operation charge.

Description

technical field [0001] The invention relates to a low-temperature plasma device for processing volatile organic compounds, which belongs to the field of processing volatile organic compounds. Background technique [0002] Volatile organic compounds (VOCs for short) are a large class of important air pollutants, which refer to organic compounds whose saturated vapor pressure exceeds 70.91Pa at normal temperature and boiling point at normal pressure is less than 260°C, and their main components are hydrocarbons. , oxygen hydrocarbons, halogenated hydrocarbons, nitrogen hydrocarbons and sulfur hydrocarbons, etc. The hazards of VOCs mainly include the following aspects: (1) Most VOCs are odorous and toxic. Many substances in VOCs are carcinogenic, teratogenic, and mutagenic. (2) Under the irradiation of light, many VOCs can easily undergo photochemical reactions with some oxidants to generate photochemical smog, which is harmful to human health and affects the growth of crops; ...

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Problems solved by technology

For example, patent 02209303.6 discloses a plasma waste gas purification device. The top of the ionization chamber is equipped with an ion gun that can move up and down. The air inlet and the gas outlet are respectively located on both sides of the ionization chamber. It is limited, and the effective utilization rate of the plasma is low, so some gases cannot or are not completely degraded, which affects its processing efficiency

Patent 200420150218.7 discloses a needle-plate pulse discharge plasma-induced photocatalytic treatment device for organic wastewater, which can also be used to trea

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