Silver nano-grain array mould plate and preparation method thereof

A technology of silver nanoparticles and arrays, applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., to achieve the effects of low cost, wide range of applications, and simple preparation methods

Inactive Publication Date: 2008-05-07
CHINA NAT ACAD NANOTECH & ENG
View PDF0 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, whether this nanoparticle array can be used as a template and combined with

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Embodiment 1: a kind of method that self-assembly method prepares silver nanoparticle template, its process steps are as follows: 1) utilize magnetron sputtering instrument, deposit one deck silver thin film on Si substrate, thickness is 8nm; 2) by thermal annealing The treatment makes the deposited silver film form discrete nanoparticles. The thermal annealing treatment is carried out under the atmosphere of high-purity nitrogen protection, the annealing temperature is 300° C., and the annealing time is 0.5 hours, so that the randomly arranged silver nanoparticle template can be prepared. It is tested with an atomic force microscope, and the test results show that the lattice form of silver particles is randomly arranged, the average diameter of the particles is 60nm, the maximum diameter is 100nm, and the density is 7.8×10 9 piece / cm 2 .

Embodiment 2

[0015] Embodiment 2: a kind of method that self-assembly method prepares silver nanoparticle template, its process steps are as follows: 1) utilize magnetron sputtering instrument, in SiO 2 Deposit a thin film of silver on the substrate with a thickness of 8nm; 2) Anneal in a vacuum environment to obtain SiO 2 For the silver nanoparticle template on the surface, the annealing temperature is 600° C., and the annealing time is 1 hour, so that the silver nanoparticle template with random arrangement can be prepared. It is tested with an atomic force microscope, and the test results show that the lattice form of silver particles is randomly arranged, the average diameter of the particles is 60nm, the maximum diameter is 120nm, and the density is 7.7×10 9 piece / cm 2 .

Embodiment 3

[0016] Embodiment 3: a kind of method that self-assembly method prepares silver nanoparticle template, its process steps are as follows: 1) utilize vacuum thermal evaporator, deposit one deck silver thin film on common glass substrate, thickness is 4nm; 2) through thermal annealing The treatment makes the deposited silver film form discrete nanoparticles. The thermal annealing treatment is carried out under the atmosphere of high-purity argon protection, the annealing temperature is 300° C., and the annealing time is 45 minutes, so that the randomly arranged silver nanoparticle template can be prepared. It is tested with an atomic force microscope, and the test results show that the lattice form of silver particles is randomly arranged, the diameter of the particles is less than 50nm, and the density is 5×10 10 piece / cm 2 , the silver template has a smaller diameter and higher density than those in Example 1 and Example 2, indicating that the size and density of the particles ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
The average diameteraaaaaaaaaa
The average diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a silver nm particle array template, which is prepared by a self assembling method. The average size of the silver nmo particles is 10 to 500 nm, and the density is 10 <8> to 10 <12> / cm <2>. The invention also discloses a preparation method of the silver nm particle array template, and the process steps are as follows: step one, a layer of uniform silver film is deposited on a base plate by using vacuum deposition film equipment; step two, discrete nm particles are formed to the deposit silver film through heat annealing process, therefore, the silver nm particle array template distributed at random can be prepared. The invention has the advantages that the silver template is prepared with the self assembling method, the average size of the silver nm particles is 10 to 500 nm, the density is 10 <8> to 10 <12> / cm <2>, and the size and the density of the nm particles can be controlled by the thickness of the silver film; the preparation method is simple, the operation is easy, and the cost is low; the silver template has the advantages of high density and random distribution, thereby being helpful to the design and the production of the device products of magnetic recording media, and flat field emitters and so on.

Description

(1) Technical field: [0001] The invention relates to a template of a nanoparticle array and a preparation method thereof, in particular to a template of a silver nanoparticle array and a preparation method thereof. (two) background technology: [0002] Because nanostructures have many novel physical and chemical properties, when they are arranged in an array according to certain rules in a plane, they have broad application prospects in the fields of magnetic storage, array electronic devices, and detectors. How to realize the two-dimensional assembly and controllable growth of nanostructures is the key to the preparation. The methods for constructing such two-dimensional nanostructure arrays mainly include nanofabrication, self-assembly, and template methods. The nanofabrication method uses a pre-designed lattice pattern to control scanning probes or focused ion beams to process one by one, such as scanning probe assisted deposition or etching, focused ion beam (FIB) and el...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B82B1/00B82B3/00
Inventor 王森
Owner CHINA NAT ACAD NANOTECH & ENG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap