Laser modeling method for semiconductor material micro-nano multi-scale function surface

A surface micromodeling and semiconductor technology, which is applied in semiconductor/solid-state device manufacturing, laser welding equipment, nanostructure manufacturing, etc., can solve the problems of high cost, difficult operation, low efficiency, etc., and achieve low cost, high preparation efficiency, and easy operation. simple effect
CN101219770AInactive Publication Date: 2008-07-16JIANGSU UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JIANGSU UNIV
Publication Date
2008-07-16
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a laser shaping method of a multi-scale functional surface of micronano for semiconductor material, relating to micronano material preparation and laser micromachining technical field; the invention aims at providing a method and a device for preparing femtosecond laser of super-hydrophobic functionalization for microstructural surface based on the semiconductor material and through the systematically technical design of multi-scale surface micro-shaping and microstructural surface processing, and realizing optional and controllable preparation of semiconductor material surface having multi-scale microstructure such as micron, submicron and nano. The invention solves the technical problems such as high cost, low efficiency and difficult operation in traditional preparation methods of microstructural surface with super-hydrophobic function.
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Description

technical field

[0001] The present invention relates to the technical field of micro-nano material preparation and laser micromachining, in particular refers to the micro-nano multi-scale microstructure processing on the surface of semiconductor materials by designing different process schemes and adopting femtosecond laser micromachining technology, and making the material surface The method of obtaining hydrophilic or hydrophobic properties can be applied to various semiconductor materials such as silicon, titanium dioxide, and gallium nitride. Background technique

[0002] Semiconductors are widely used in science and technology, industrial and agricultural production and life. Among them, semiconductor devices made of silicon have better high temperature resistance and radiation resistance, and are especially suitable for making high-power devices. Therefore, silicon has become the most widely used additive material, and most of the current integrated circuits are made o...

Claims

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