Method for manufacturing high anti-corrosion nanometer composite plating coat
A nano-composite, high-corrosion-resistant technology, applied in the field of high-corrosion-resistant nano-composite coatings obtained by surface treatment technology, can solve the problems of no patents and research papers, no composite functional coatings, thick coatings and poor corrosion resistance and other issues to achieve the effect of improving physical and chemical properties, reducing stress, and reducing emissions
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Embodiment 1
[0038] The base material is a copper base material, and its preparation method is as follows:
[0039] The copper substrate is firstly pretreated, and the pretreatment of the copper substrate includes the following steps:
[0040] 1) The process formula of chemical degreasing is:
[0041] NaOH is 10g / L, Na 3 PO 4 25g / L, K 2 CO 3 10g / L.
[0042] The temperature of chemical degreasing is 55°C, the ultrasonic chemical degreasing is carried out by using PP tank and ultrasonic oscillator, the current is 8A, and the chemical degreasing time is 3min.
[0043] 2) For the first washing, use pure water for rinsing, the rinsing temperature is 35°C, and the rinsing time is 1.5min.
[0044] 3) The technological formula of acid activation is:
[0045] Ammonium persulfate is 2.5g / L, sulfuric acid is 20ml / L.
[0046] The acid activation temperature is room temperature, and the acid activation time is 1 min.
[0047] 4) The process and process conditions of the second water washing ar...
Embodiment 2
[0059] Similar to Example 1, its difference is that the process formula of the chemical degreasing of copper substrate pretreatment is:
[0060] NaOH is 15g / L, Na 3 PO 4 30g / L, K 2 CO 3 It is 8g / L.
[0061] The temperature of chemical degreasing is 50°C, the ultrasonic chemical degreasing is carried out by using PP tank and ultrasonic oscillator, the current is 5A, and the time of chemical degreasing is 4min. The first water washing is rinsed with pure water, the rinse temperature is 20°C, and the rinse time is 2min. The technological formula of acid activation is: ammonium persulfate is 3g / L, sulfuric acid is 30ml / L. The acid activation temperature is room temperature, and the acid activation time is 0.5 min. The plating solution formula for electroplating the amorphous nanocomposite nickel layer on the base material after pretreatment is: nickel sulfate is 270g / L, nickel chloride is 50g / L, boric acid is 40g / L, and nano-nickel-phosphorus alloy powder slurry is 0.1g / L, ...
Embodiment 3
[0072] Similar to Example 1, the difference is that the copper substrate pretreatment comprises the following steps:
[0073] The process formula of chemical degreasing is:
[0074] NaOH is 20g / L, Na 3 PO 4 20g / L, K 2 CO 3 It is 12g / L. The temperature of chemical degreasing is 60°C, the ultrasonic chemical degreasing is carried out by using PP tank and ultrasonic oscillator, the current is 2A, and the time of chemical degreasing is 5min. The first water washing is rinsed with pure water, the rinse temperature is 50°C, and the rinse time is 1min. The technological formula of acid activation is: ammonium persulfate is 2g / L, sulfuric acid is 25ml / L. The acid activation temperature is room temperature, and the acid activation time is 0.7 min. The plating solution formula for electroplating the amorphous nanocomposite nickel layer on the base material after pretreatment is: nickel sulfate is 300g / L, nickel chloride is 55g / L, boric acid is 35g / L, and nano-nickel-phosphorus al...
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