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Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same

A photosensitive composition and composition technology, applied in the field of photosensitive compositions, can solve problems such as insufficient sensitivity, decreased productivity, defects, etc., and achieve the effects of high sensitivity, excellent pattern forming performance, and high stability over time

Active Publication Date: 2012-10-03
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If a large amount of coloring material is added to obtain a high color density, the sensitivity may not be sufficient to faithfully reproduce the shape of a fine image pattern under 2.5 μm, so that pattern defects often occur on products
To avoid these defects, light irradiation must be performed at higher energies, which requires long exposure times and leads to a significant drop in productivity

Method used

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  • Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same
  • Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same
  • Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0462] Synthesis Example 1: Synthesis of Compound 1 corresponding to a specific oxime compound N-hydroxyxime (10.00 g, 19.0 mmol) and triethylamine (2.31 g, 22.8 mmol) having the structure shown below were dissolved in 200 ml of THF and Cool to 0 °C. Acetyl chloride (1.79 g, 22.8 mmol) was then added dropwise thereto. After the mixture was stirred at room temperature for 1 hour, 100 ml of distilled water was added thereto, and the organic layer was extracted with ethyl acetate. After removing the solvent by distillation under reduced pressure, the obtained residue was purified by silica gel chromatography (ethyl acetate / hexane=1 / 4) to obtain Compound 1 having the structure shown below (9.5 g, 88% yield ).

[0463] Compound 1

[0464] Using an ultraviolet-visible spectrophotometer (trade name: CARRY-5 Spectrophotometer, manufactured by Varian), the obtained molar absorptivity of Compound 1 at 365 nm was measured in an ethyl acetate solution at a concentration of 0.01 g / L a...

Embodiment 2

[0465] Synthesis Example 2: Synthesis of Compound 7 corresponding to a specific oxime compound N-hydroxyxime (10.00 g, 22.9 mmol) and triethylamine (2.78 g, 27.5 mmol) having the structure shown below were dissolved in 200 ml of THF and Cool to 0 °C. Acetyl chloride (2.16 g, 27.5 mmol) was then added dropwise thereto. After the mixture was stirred at room temperature for 1 hour, 100 ml of distilled water was added thereto, and the organic layer was extracted with ethyl acetate. After the solvent was removed by distillation under reduced pressure, the precipitated crystals were recrystallized from methanol to obtain Compound 7 (9.2 g, 84% yield) of the structure shown below.

[0466] Compound 7

[0467] Using an ultraviolet-visible spectrophotometer (trade name: Carry-5 Spectrophotometer, manufactured by Varian), the obtained molar absorptivity of Compound 7 at 405 nm was measured in an ethyl acetate solution at a concentration of 0.01 g / L and found to be 21,380. The struc...

Embodiment 2-11

[0475] Example 2-11. Preparation of Colored Curable Composition A-1 A negative coloring curable composition (A-1) containing a colorant (pigment) was prepared as a curable composition for forming a color filter. A color filter was produced using this colored curable composition.

[0476] 1-1. Preparation of pigment dispersion (P1) 40 parts by mass of C.I. Pigment Green 36 and C.I. Pigment Yellow 219 (mass ratio 30 / 70) of the pigment mixture, 10 parts by mass (4.51 parts by mass in terms of solid content) A liquid mixture consisting of BYK 2001 (DISPERBYK, manufactured by BYK-Chemie, 45.1% by mass in terms of solid content) as a dispersant, and 150 parts by mass of ethyl 3-ethoxypropionate as a solvent in a bead mill Mixing and dispersion were carried out for 15 hours to prepare a pigment dispersion liquid (P1).

[0477] The average particle size of the pigment in the obtained pigment dispersion (P1) was 200 nm as measured by dynamic light scattering.

[0478] 1-2. Preparatio...

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Abstract

A photosensitive composition includes a compound represented by Formula (I) and a curable composition contains the compound of Formula (I) and a polymerizable compound. A compound is represented by a Formula (1) and a photocurable composition contains the compound of Formula (1) and a polymerizable compound. In Formula (I), R, R1 and R2 each independently represent a hydrogen atom or a monovalent substituent. In Formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.

Description

technical field [0001] The present invention relates to a photosensitive composition, a curable composition, a curable composition for a color filter, a color filter and methods for their preparation. The present invention also relates to novel oxime compounds, photopolymerizable compositions, photopolymerizable compositions for color filters, color filters and their preparation methods, solid-state imaging devices, and lithographic printing precursors. Background technique [0002] The photosensitive or photopolymerizable composition may contain, for example, an ethylenically unsaturated bond-containing polymerizable compound and a photopolymerization initiator. Such photosensitive or photopolymerizable compositions polymerize and cure when they are irradiated with light, and thus are used in, for example, photocurable inks, photosensitive printing plates, color filters and various photoresists. In other types of photosensitive or photopolymerizable compositions, for examp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G02B5/20G03F7/00H01L27/146G03F7/09
Inventor 土村智孝
Owner FUJIFILM CORP