Method for coating colloidal sol-gel film on surface of porous substrate
A surface coating, substrate surface technology, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve the problems of increasing process steps, increasing costs, easily destroying inorganic thin films, and achieving the effect of improving separation efficiency
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Embodiment 1
[0032] 1. Anodized Al with plastic edge ring 2 o 3 The substrate (Anodisc25, pore size 20nm) is placed on the Si support pad;
[0033] 2. Heat on the electric heating plate to melt the plastic edge ring, and through adhesion, the periphery is sealed with anodized Al 2 o 3 The substrate is on the Si wafer support pad, only Al is exposed 2 o 3 Substrate single sided.
[0034] 3. By sealing the porous substrate on one side and exposing the other side of the porous substrate, coating the sol on the exposed surface of the porous substrate, the air in the pores of the substrate is compressed to form an air cushion, which prevents the sol liquid from flowing into the hole, thus forming on the surface of the substrate. Homogeneous sol-gel film; where:
[0035] Preparation of sol: Dilute 10 g of ethyl orthosilicate in 30 g of ethanol, add 4 g of aqueous hydrochloric acid (0.1 mol / l), and stir at 60° C. for 1 h. Then add ethanol as solvent C 16 h 33 (OCH 2 CH 2 ) 10 OH surfa...
Embodiment 2
[0040] 1. Anodized Al 2 o 3 The substrate (Anodisc25, pore size 100nm) is placed on the Si support pad;
[0041] 2. Use paraffin as the sealing material, connect and seal the bottom of the substrate with the backing plate, and only expose Al 2 o 3 Substrate single side;
[0042] 3. By sealing the porous substrate on one side and exposing the other side of the porous substrate, coating the sol on the exposed surface of the porous substrate, the air in the pores of the substrate is compressed to form an air cushion, which prevents the sol liquid from flowing into the hole, thus forming on the surface of the substrate. Homogeneous sol-gel film; where:
[0043] Sol preparation: Dilute 10 g tetraethyl orthosilicate in 30 g ethanol, add 4 g hydrochloric acid aqueous solution (0.1 mol / l), stir at 60° C. for 1 h, until a transparent and clear sol is obtained.
[0044] Coating sol: use the spin coating method, place the backing plate sealed with the porous substrate on the spin co...
Embodiment 3
[0048] 1. Place a track-etched polycarbonate membrane (Whatman Cyclopore) with a pore size of 200 nm on the Si sheet support plate;
[0049] 2. Use silica gel as the sealing material to connect and seal the peripheral edge of the substrate with the backing plate, and only expose the track to etch one side of the organic substrate;
[0050] 3. By sealing the porous substrate on one side and exposing the other side of the porous substrate, coating the sol on the exposed surface of the porous substrate, the air in the pores of the substrate is compressed to form an air cushion, which prevents the sol liquid from flowing into the hole, thus forming on the surface of the substrate. Homogeneous sol-gel film; where:
[0051] Preparation of sol: Dilute 10 g tetraethyl orthosilicate in 40 g ethanol, add 4 g aqueous hydrochloric acid (0.1 mol / l), stir at 60° C. for 1 h, until a transparent and clear sol is obtained.
[0052] Coating sol: adopt the pulling coating method, immerse the ba...
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