Method for optimizing L1<0>-FePt film microstructure
A technology of l10-fept and microstructure, applied in the application of magnetic film to substrate, sputtering coating, ion implantation plating, etc., can solve the uneven grain size distribution of FePt thin film, grain size Coarse, ordered domains are coarse, etc., to achieve the effect of reducing grain size, uniform grain size, and improving microstructure
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[0014] At room temperature, a pristine FePt thin film 4 with a composition ratio of 1:1 was grown on a naturally oxidized Si substrate by magnetron sputtering technology. The FePt film was subjected to high-pressure annealing experiments on a Gleeble-3500 thermal simulator. Experimental device such as figure 1 shown. Place the FePt thin film 4 face down in a high-strength graphite sleeve 3, fill with cubic boron nitride 8 as the pressure transmission medium, and seal it with a graphite cover, then place the high-strength graphite with the FePt thin film 4 Sleeve 3 is packed into an inner diameter equal to the diameter of the graphite sleeve in a die formed by an inner die 6 and an outer die 7, and two opposing indenters 5 are mounted on both sides of the high-strength graphite sleeve 3 . The pressure is vertically applied to the surface of the FePt thin film 4 through the high-strength graphite sleeve 3 by using the two opposing indenters. The pressure is calculated from th...
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