Mg-Na codoped ZnO-base light emitting diode and preparation method thereof
A light-emitting diode, mg-na technology, applied in electrical components, circuits, semiconductor devices, etc., to achieve the effect of improving stability, high brightness, and reducing growth steps
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Embodiment 1
[0021] Prepare the Mg-Na co-doped ZnO-based light-emitting diode according to the following steps:
[0022] (1) Weigh 38.61 grams of pure ZnO, 1.15 grams of MgO, and Na 2 CO 3 It is 0.053 grams of powder, in which the molar percentage of Mg is 5% and the molar percentage of Na is 0.1%. The above powders are uniformly mixed by ball milling, pressed and molded, and then sintered at 1000 ℃ to obtain Mg-Na total Doped ZnO ceramic target.
[0023] (2) With a 10mm×10mm low-resistance n-ZnO (0001) single crystal as the substrate, put the substrate and the prepared ZnO ceramic target into the growth chamber of the pulsed laser deposition system, and the vacuum degree of the growth chamber is pumped to 4.0 ×10 -4 Pa, then heat the substrate to raise the substrate temperature to 400°C, input oxygen, adjust the oxygen pressure to 30Pa, set the laser parameters to 330mJ, 5Hz, and the substrate and the ZnO ceramic target at a distance of 4.5cm, and deposit under this condition A layer of about...
Embodiment 2
[0027] 1) Weigh 35.608 grams of pure ZnO, 2.76 grams of MgO, and Na 2 CO 3 It is 0.265 grams of powder, in which the molar percentage of Mg is 12% and the molar percentage of Na is 0.5%. The above powders are ball-milled and mixed uniformly, pressed and molded, and then sintered at a temperature of 1100°C to obtain Mg-Na. Doped ZnO ceramic target.
[0028] 2) Take the 10mm×10mm n-ZnO(0001) single crystal as the substrate, put the substrate and the prepared ZnO ceramic target into the growth chamber of the pulsed laser deposition system, and pump the vacuum degree of the growth chamber to 4.0×10 -4 Pa, then heat the substrate to raise the substrate temperature to 500℃, input oxygen, adjust the oxygen pressure to 40Pa, set the laser parameters to 330mJ, 5Hz, and the substrate and the ZnO ceramic target at a distance of 4.5cm, and deposit under this condition A p-type ZnO layer co-doped with Mg-Na of about 400 nm, the hole concentration of p-type ZnO can be as high as 8.0×10 17 cm -3...
Embodiment 3
[0033] 1) Weigh pure ZnO to 32.556 grams, MgO to 3.8 grams, and Na 2 CO 3 It is 0.53 grams of powder, in which the molar percentage of Mg is 19%, and the molar percentage of Na is 1%. The above-mentioned powders are ball-milled and mixed uniformly, pressed and molded, and then sintered at 1200°C to obtain Mg-Na. Doped ZnO ceramic target.
[0034] 2) Take the 10mm×10mm n-ZnO(0001) single crystal as the substrate, put the substrate and the prepared ZnO ceramic target into the growth chamber of the pulsed laser deposition system, and pump the vacuum degree of the growth chamber to 4.0×10 -4Pa, then heat the substrate to raise the substrate temperature to 680℃, input oxygen, adjust the oxygen pressure to 50Pa, set the laser parameters to 330mJ, 5Hz, and the substrate and the ZnO ceramic target at a distance of 4.5cm, and deposit under this condition A p-type ZnO layer of about 500nm Mg-Na co-doped, the hole concentration of p-type ZnO can be as high as 2.0×10 17 cm -3 . Then the oxyge...
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