Method for producing optical film, optical film, polarizing plate and display

A technology of optical film and film method, which is applied in the direction of optics, optical elements, polarizing elements, etc., can solve the problems of peeling deterioration, low production speed, and reduced production speed, so as to reduce the constraints of film production conditions and reduce the delay value. Average, productivity-enhancing effects

Inactive Publication Date: 2010-02-03
KONICA MINOLTA OPTO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Generally, the solution casting film-making method includes casting a resin solution (hereinafter referred to as a slurry) containing a thermoplastic resin and an additive on a support made of a rotary-driven stainless steel endless belt, a drum or a roller, In this film-forming method, although it varies somewhat depending on the type of resin, the proportion of poor solvent, etc., the mass ratio of the total solvent amount to the solid content of the film is about 60% by mass, and there is a possibility that the film is supported from the metal. Areas where the exfoliation force on the body is increased resulting in exacerbated exfoliation
[0005] In this region, the film cannot be peeled off from the metal support smoothly, accompanied by severe peeling unevenness and peeling sound, and at the same time, due to the unevenness, the film produces obvious step-like deformation extending in the width direction, so , had to adopt the conditions of avoiding this area in production, and was restricted in membrane production
[0006] The poor peeling area varies due to the type of slurry raw material, such as the type of resin, the addition ratio of poor solvent, and the temperature of the film during peeling. Both have the above-mentioned poor peeling area
[0007] In order to avoid such a poor peeling area, for example, the film production is selected on the so-called high residual solvent (area where the amount of residual solvent is higher than the above-mentioned area where the peeling force increases) of the cast film (hereinafter referred to as wet film). During conditions, especially when the film thickness of the product is manufactured as a film below 40 μm, there is a problem that even if the temperature of the drying air blown in order to dry the cast film on the support is lowered, the evaporation rate of the solvent dichloromethane Large, drying will continue, unable to achieve high residual solvent stripping conditions
[0008] Therefore, in order to achieve high residual solvent stripping, the production speed of the film can only be increased. In this case, there are problems such as the need to increase the capacity of the solvent recovery equipment, or to extend the post-drying step in order to reduce the amount of residual solvent in the product film to a limit value, etc. Carry out large-scale equipment renovation
However, when a low residual solvent stripping condition is formed, the drying of the casting film enters the deceleration drying period. Therefore, if the drying time on the metal support is not significantly prolonged, the residual solvent cannot be reduced, and thus the production has to be greatly reduced. The problem of production speed
[0010] In this way, the conventional production had the following problem: due to the existence of poor peeling and residual solvent regions of the metal support, the film production had to be performed at a production rate that was significantly lower than the capacity of the equipment.

Method used

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  • Method for producing optical film, optical film, polarizing plate and display
  • Method for producing optical film, optical film, polarizing plate and display
  • Method for producing optical film, optical film, polarizing plate and display

Examples

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Embodiment 1

[0300] (atmospheric pressure plasma treatment)

[0301] The gap (d) between the ejection slit (h) of the atmospheric pressure plasma device (20) and the surface of the metal support (s) is set to 2 mm. Under this condition, the metal support (s) is transported while the metal support (s) A plasma irradiation process is performed for 0.0005 seconds by passing under the atmospheric pressure plasma device (20). Since the exact contact time between the free radical and the metal support (s) is difficult to measure, the plasma irradiation time referred to here refers to the time from a certain point on the surface of the metal support (s) from the spray slit (h) Time for the bottom to move across the opening width of the slit (h). For example, if the opening width of the ejection slit (h) is 2 mm and the moving speed of the metal support (s) is 2 mm / sec, the plasma irradiation time is 1 sec. In addition, the amount of reaction gas (g) used is 3m per 1m of irradiation width 3 / mi...

Embodiment 2

[0304] The only difference from Example 1 is that the plasma irradiation treatment time is 0.01 second, and the solvent vapor concentration near the surface of the plasma (s) before entering the atmospheric pressure plasma device (20) is methylene chloride 6500ppm, methanol 1500ppm, others are identical with embodiment 1.

Embodiment 3

[0306] The difference from Example 2 is that 1% by volume of oxygen is added to the reaction gas (g), and the others are the same as in Example 2.

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Abstract

A method for producing an optical film by a solution spreading film deposition method, in which a poor stripping region of a metal support can be eliminated by spreading dope on the surface of the metal support after a surface treatment film is formed on the surface of the metal support by atmospheric pressure plasma processing or excimer UV processing. Consequently, limitation on the conditions of film production is reduced and productivity is enhanced. Furthermore, since stripping of the film is enhanced, lateral variation in stripping position is reduced and variation in retardation value is reduced sharply, and thereby an optical film having optical characteristics excellent in transparency and planarity can be produced. Consequently, a method for producing an optical film, an opticalfilm, a polarizing plate and a display which can meet the demands of a high quality thin and wide protective film for polarizing plate can be provided.

Description

technical field [0001] The present invention relates to a method for producing an optical film, an optical film, a polarizer, and a display device, and the optical film can be used for various functional films, etc., and the functional film is a protective film for a polarizer used in a liquid crystal display device (LCD), Retardation films, viewing angle expansion films, anti-reflection films used in plasma displays, etc. Background technique [0002] In recent years, liquid crystal display devices have been gradually used in televisions or large monitors due to the improvement of their image quality and the improvement of high-definition technology. The cost and the like place strong demands on the material of the liquid crystal display device, and at the same time, widening of the optical film is also required. [0003] In addition, in recent years, in order to adapt to the rapid growth of LCD TVs, the demand for optical films has also increased rapidly, and there is a s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B29C41/24B29C41/34G02B5/30B29L7/00B29L11/00
CPCB29K2001/00G02F1/133528B29K2995/0018B29K2001/12B29C41/28G02B5/3033B29C41/24B29C41/34B29L2011/00G02B5/30
Inventor 金子忠浩
Owner KONICA MINOLTA OPTO
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