Purification system of anhydrous hydrogen fluoride gas

Abstract

The invention relates to a purification system of anhydrous hydrogen fluoride gas, belonging to the field of chemical engineering. The purification system comprises an air inlet pipeline, an air outlet pipeline, a purification tower, a dust collecting device and a back flushing device, wherein the air inlet pipeline is positioned at the lower half part of the purification tower, and the air outlet pipeline is arranged at the upper half part of the purification tower; membrane material resisting the temperature of 20-100 DEG C and the negative pressure of 1000-3000MPa is arranged inside the purification tower; the membrane material has the aperture less than 1mu m, hydrofluoric acid corrosion resistance and the total specific surface area more than 180m2 / g; the upper end of the collecting device is connected with the bottom of the purification tower; the back flushing device is positioned at the upper half part or the top of the purification tower, one end of the back flushing device is connected with the purification tower, and the other end is connected with an air compressor. The purification system has the advantages of low cost, easy controlled technical parameters, convenient working condition operation, safety, environmental protection, large-scale continuous production, etc. By adopting the system, under the normal temperature and pressure, the anhydrous hydrogen fluoride gas contains the content of dust particles less than 5g / m3, and the removed dust particles have the size within 200-500nm and mainly comprises fluorine, silicon, phosphorus, ferrum, sulfur, oxygen, etc.

Description

Technical field [0001] The invention belongs to the technical field of chemical production, and specifically relates to a purification system for anhydrous hydrogen fluoride gas. Background technique [0002] In the prior art, anhydrous hydrogen fluoride gas is mainly prepared by reacting inorganic fluoride with acid. Therefore, the various impurities contained in inorganic fluoride will cause a large number of dust particles to be carried in the anhydrous hydrogen fluoride gas, especially those containing sub-micron and nano-sized particles. The existence of these dust particles will directly affect the use of anhydrous hydrogen fluoride gas as a raw material The subsequent product performance generated. [0003] In recent years, the purification methods of anhydrous hydrogen fluoride gas mainly include ways to improve the production process, continuously update equipment, and improve the quality of inorganic fluoride. For example, domestic related companies adopt a production p...

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Problems solved by technology

However, this method is complicated in process, high in energy consumption, and can only remove one kind of silicon-containing dust particles

[0004] The above disclosed production process or equipment for purifying anhydrous hydrogen fluoride gas mainly has the following disadvantages: 1. The dust particles in the hydrogen fluoride gas are not removed cleanly, and the purification effect is not ideal, especially for small particles below the submicron and nanometer scale, It seems powerless; 2. The price is expensive and the production process is complicated; 3. The energy consumption is high, the process parameters fluctuate greatly, the production process is difficult to control, and it is easy to cause environmental pollution

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