High-thermal conductive metal base plate used for transferring gallium nitride epitaxial layer of LED and preparation method thereof

A metal substrate, high thermal conductivity technology, used in semiconductor devices, electrical components, circuits, etc., can solve problems such as affecting processing, large differences in expansion coefficients, and cracking of gallium nitride epitaxial layers, to prevent cracking and improve service life. Long, low production cost effect

Inactive Publication Date: 2010-06-09
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after the GaN epitaxial layer is transferred to the metal substrate, due to the large difference in expansion coefficient between the substrate metal and GaN, the GaN epitaxial layer is cracked, which affects the subsequent processing of the LED.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] On the surface of the substrate grown with gallium nitride, a layer of metal chromium is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal tin on the surface of the conductive substrate; then through the electroless plating process, plate a layer of metal gold on it; the metal coating tin and gold are alternately plated three times to obtain nitrogen for LED The buffer structure for GaN epitaxial layer transfer; then thicken by electroplating copper, and finally grow a layer of gold on the copper surface by sputtering process; then a high thermal conductivity metal substrate for GaN epitaxial layer transfer for LED can be obtained.

Embodiment 2

[0027] On the surface of the substrate on which gallium nitride is grown, a layer of metal gold is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal copper on the surface of the conductive substrate; then through the electroless plating process, plate a layer of metal tin on it; the metal plating tin and copper are alternated three times to obtain the nitride for LED The buffer structure for the transfer of the gallium epitaxial layer; then it is thickened by electroplating copper, and finally a layer of gold is plated on the copper surface through the electroless plating process; then a high thermal conductivity metal substrate for the transfer of the gallium nitride epitaxial layer for LED can be obtained.

Embodiment 3

[0029] On the surface of the substrate on which gallium nitride is grown, a layer of metal gold is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal nickel on the surface of the conductive substrate; then ion plating process, plate a layer of metal aluminum on it; the metal plating nickel and aluminum alternate three times to obtain gallium nitride for LED Buffer structure for epitaxial layer transfer; then thickened by electroplating copper; finally, a layer of metal platinum is grown on the copper surface by sputtering process; then a high thermal conductivity metal substrate for silicon-based gallium nitride epitaxial layer transfer for LED can be obtained.

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Abstract

The invention discloses a high-thermal conductive metal base plate used for transferring a gallium nitride epitaxial layer of an LED and a preparation method thereof. The method comprises the following steps: performing conductive treatment on a substrate with a gallium nitride film layer; plating a metal A on the surface of the substrate with the gallium nitride film layer; plating a metal B on the surface of the metal A plating layer; alternately plating the metals A and B repeatedly to form a multilayer metal structure; thickening the surface of the multilayer metal structure by electroplating copper; plating a metal C on the surface of the copper; and finally, obtaining the high-thermal conductive metal base plate used for transferring the gallium nitride epitaxial layer of the LED. All the raw materials adopted by the invention do not contain heavy metals, so the raw materials are environment-friendly, the raw materials are simple and easily obtained, and the production process is easy to operate; and a metal base plate LED luminous device prepared by the method of the invention after transferring is applicable to the field of high-power LEDs. The prepared LED has the advantages of high luminous efficiency, low energy consumption, long service life and lower production cost, and accords with the condition of large-scale industrial application; and the quality of the LED accords with European Union Standards and United States Standards.

Description

technical field [0001] The invention relates to a metal base plate with high thermal conductivity used for LED gallium nitride epitaxial layer transfer and a preparation method thereof. Background technique [0002] GaN-on-Si epitaxial layer transfer technology is a hot research direction in the LED field in recent years. Researchers grow gallium nitride on materials such as silicon, sapphire, and SiC to produce light-emitting diodes (LEDs). However, due to the poor heat dissipation of sapphire, the LED produced has a short service life, which seriously affects its practical field; and the high production cost of SiC substrate also limits its industrial application. In this case, one turns the substrate to monocrystalline silicon. Due to the mature production process of monocrystalline silicon and the easy availability of raw materials, it is gradually replacing the previous substrate material. With the deepening of research, it was found that silicon absorbs visible ligh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/64
Inventor 崔国峰丁坤
Owner SUN YAT SEN UNIV
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