Photoresist detergent composition
A cleaning agent and composition technology, applied in the direction of photosensitive material processing, etc., can solve the problems of insufficient cleaning ability of thick film photoresist, strong corrosiveness of semiconductor wafer patterns and substrates, and harmful environment, and achieve the suppression of corrosion dark spots, Conducive to environmental protection and anti-corrosion effect
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Embodiment 1~26
[0043] Table 1 shows the formulations of the photoresist cleaning composition examples 1 to 26 of the present invention. According to the components listed in Table 1 and their contents, simply mix them uniformly to prepare the cleaning compositions.
[0044] Table 1 Photoresist cleaning agent composition embodiment 1~26 of the present invention
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[0051] The beneficial effects of the present invention will be further described below through preferred effect embodiments of the present invention.
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