Resource utilization method of silicon wafer cutting and machining mortar at room temperature
A silicon wafer cutting and recycling technology, applied in the field of resource utilization of silicon wafer cutting and processing mortar at room temperature, can solve the problems of equipment investment and operating cost increase, decomposition, resource utilization efficiency decline, etc.
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Embodiment 1
[0031] Utilize the technology of the present invention to process silicon wafer cutting mortar at room temperature, wherein the mass ratio of silicon carbide and cutting fluid is 1:1, and the mass ratio of silicon carbide and cutting fluid in the silicon wafer cutting mortar is 45%. Silicon and cutting fluid came from Lianyungang Jiayu Electronic Material Technology Co., Ltd. The specific steps are as follows:
[0032] Step 1: Send 1000Kg of mortar that has been pretreated to remove large particles of impurities into a 2000L mixing tank through a delivery pump. After starting to stir for 10 minutes, add 50Kg of interface modifier within 20 minutes. The mixing temperature is room temperature. The composition is: polyethylene glycol 200 (PEG200) 25g, polyethylene glycol 10000 (PEG10000) 10g, nonionic surfactant (OP-10) 10g, penetrant (JFC) 5g. The mixture was further stirred and mixed uniformly at room temperature for 1 hour.
[0033] In step 2, the above mixture is transporte...
Embodiment 2
[0037]Utilize the technology of the present invention to process silicon wafer cutting mortar under room temperature conditions, wherein the mass ratio of silicon carbide and cutting fluid is 1: 1, the mass ratio of silicon carbide in the silicon wafer cutting mortar is 50%, and the mass ratio of cutting fluid is 42%, the silicon carbide used comes from Zhengzhou Haiwang Micro Powder Co., Ltd., and the cutting fluid comes from Lianyungang Jiayu Electronic Material Technology Co., Ltd. The specific steps are as follows:
[0038] Step 1: Send 1000Kg of mortar that has been pretreated to remove large particles of impurities into a 2000L mixing tank, start stirring for 10 minutes, add 40Kg of interface modifier within 20 minutes, the mixing temperature is room temperature, and the separation agent The composition is: polyethylene glycol 400 (PEG200) 10g, nonionic surfactant (OP-10) 10g, penetrant (JFC) 20g. The mixture was further stirred and mixed uniformly at room temperature f...
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